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Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate

Meng, Fantao; Luo, Gang LU ; Maximov, Ivan LU ; Montelius, Lars LU ; Chu, Jinkui and Xu, Hongqi LU (2011) In Microelectronic Engineering 88(10). p.3108-3112
Abstract
In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Bilayer wire-grid polarizer, Nanoimprint lithography, Flexible plastic, substrate, TM transmission, Extinction ratio
in
Microelectronic Engineering
volume
88
issue
10
pages
3108 - 3112
publisher
Elsevier
external identifiers
  • wos:000297400900011
  • scopus:80052817630
ISSN
1873-5568
DOI
10.1016/j.mee.2011.06.008
language
English
LU publication?
yes
id
bd02b27b-d6fa-47e8-a21e-620646644d62 (old id 2291710)
date added to LUP
2012-01-11 12:49:12
date last changed
2017-08-20 03:09:01
@article{bd02b27b-d6fa-47e8-a21e-620646644d62,
  abstract     = {In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.},
  author       = {Meng, Fantao and Luo, Gang and Maximov, Ivan and Montelius, Lars and Chu, Jinkui and Xu, Hongqi},
  issn         = {1873-5568},
  keyword      = {Bilayer wire-grid polarizer,Nanoimprint lithography,Flexible plastic,substrate,TM transmission,Extinction ratio},
  language     = {eng},
  number       = {10},
  pages        = {3108--3112},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate},
  url          = {http://dx.doi.org/10.1016/j.mee.2011.06.008},
  volume       = {88},
  year         = {2011},
}