Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers

Sangermano, M. ; Bongiovanni, R. ; Malucelli, G. ; Priola, A. ; Olbrych, J. ; Harden, A. and Rehnberg, N. LU orcid (2004) In Journal of Polymer Science, Part A: Polymer Chemistry 42(6). p.1415-1420
Abstract

The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration.

Please use this url to cite or link to this publication:
author
; ; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Cationic photopolymerization, Coatings, Differential scanning calorimetry (DSC), Oxetane monomers, Silicon monomers, Surface tension, Wettability
in
Journal of Polymer Science, Part A: Polymer Chemistry
volume
42
issue
6
pages
6 pages
publisher
John Wiley & Sons Inc.
external identifiers
  • scopus:1542335769
ISSN
0887-624X
DOI
10.1002/pola.20005
language
English
LU publication?
no
id
231a9c7a-5460-4832-abd0-a4ac90880a2f
date added to LUP
2021-11-25 11:39:04
date last changed
2022-04-03 22:07:52
@article{231a9c7a-5460-4832-abd0-a4ac90880a2f,
  abstract     = {{<p>The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration.</p>}},
  author       = {{Sangermano, M. and Bongiovanni, R. and Malucelli, G. and Priola, A. and Olbrych, J. and Harden, A. and Rehnberg, N.}},
  issn         = {{0887-624X}},
  keywords     = {{Cationic photopolymerization; Coatings; Differential scanning calorimetry (DSC); Oxetane monomers; Silicon monomers; Surface tension; Wettability}},
  language     = {{eng}},
  month        = {{03}},
  number       = {{6}},
  pages        = {{1415--1420}},
  publisher    = {{John Wiley & Sons Inc.}},
  series       = {{Journal of Polymer Science, Part A: Polymer Chemistry}},
  title        = {{Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers}},
  url          = {{http://dx.doi.org/10.1002/pola.20005}},
  doi          = {{10.1002/pola.20005}},
  volume       = {{42}},
  year         = {{2004}},
}