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Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis

Wang, Tiegang LU ; Jeong, Dawoon; Kim, Soo-Hyun; Wang, Qimin; Shin, Dong-Woo; Melin, Solveig LU ; Iyengar, Srinivasan LU and Kim, Kwang Ho (2012) In Surface & Coatings Technology 206(10). p.2629-2637
Abstract
Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and... (More)
Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Cr2O3 film, Arc ion plating, Bias voltage, Grain size, Surface, morphology, HRTEM
in
Surface & Coatings Technology
volume
206
issue
10
pages
2629 - 2637
publisher
Elsevier
external identifiers
  • wos:000299713600001
  • scopus:84855258565
ISSN
0257-8972
DOI
10.1016/j.surfcoat.2011.10.058
language
English
LU publication?
yes
id
266c0db9-a406-4adc-a507-56b65a5678b1 (old id 2416388)
date added to LUP
2012-03-28 10:01:18
date last changed
2017-08-13 03:52:21
@article{266c0db9-a406-4adc-a507-56b65a5678b1,
  abstract     = {Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved.},
  author       = {Wang, Tiegang and Jeong, Dawoon and Kim, Soo-Hyun and Wang, Qimin and Shin, Dong-Woo and Melin, Solveig and Iyengar, Srinivasan and Kim, Kwang Ho},
  issn         = {0257-8972},
  keyword      = {Cr2O3 film,Arc ion plating,Bias voltage,Grain size,Surface,morphology,HRTEM},
  language     = {eng},
  number       = {10},
  pages        = {2629--2637},
  publisher    = {Elsevier},
  series       = {Surface & Coatings Technology},
  title        = {Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2011.10.058},
  volume       = {206},
  year         = {2012},
}