A comparison of thermally and photochemically cross-linked polymers for nanoimprinting
(2003) In Microelectronic Engineering 67-8. p.266-273- Abstract
- The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked... (More)
- The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/307070
- author
- organization
- publishing date
- 2003
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- resist, nanoimprint lithography, chemically amplified, cross-linked polymers
- in
- Microelectronic Engineering
- volume
- 67-8
- pages
- 266 - 273
- publisher
- Elsevier
- external identifiers
-
- wos:000183842100037
- scopus:0038697349
- ISSN
- 1873-5568
- DOI
- 10.1016/S0167-9317(03)00079-0
- language
- English
- LU publication?
- yes
- id
- 258d0f47-238a-40e0-9a7e-32bf22736bd7 (old id 307070)
- date added to LUP
- 2016-04-01 12:13:07
- date last changed
- 2022-03-05 20:33:08
@article{258d0f47-238a-40e0-9a7e-32bf22736bd7, abstract = {{The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers.}}, author = {{Pfeiffer, K and Reuther, F and Fink, M and Gruetzner, G and Carlberg, Patrick and Maximov, Ivan and Montelius, Lars and Seekamp, J and Zankovych, S and Sotomayor-Torres, C M and Schulz, H and Scheer, H C}}, issn = {{1873-5568}}, keywords = {{resist; nanoimprint lithography; chemically amplified; cross-linked polymers}}, language = {{eng}}, pages = {{266--273}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{A comparison of thermally and photochemically cross-linked polymers for nanoimprinting}}, url = {{http://dx.doi.org/10.1016/S0167-9317(03)00079-0}}, doi = {{10.1016/S0167-9317(03)00079-0}}, volume = {{67-8}}, year = {{2003}}, }