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High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching

Esmeraldo Paiva, Aislan ; Gerlt, Michael S LU orcid ; Läubli, Nino F ; Prochukhan, Nadezda ; Baez Vasquez, Jhonattan Frank ; Kaminski Schierle, Gabriele S and Morris, Michael A (2023) In ACS applied materials & interfaces 15(50). p.57960-57969
Abstract

The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our... (More)

The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.

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author
; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
ACS applied materials & interfaces
volume
15
issue
50
pages
10 pages
publisher
The American Chemical Society (ACS)
external identifiers
  • scopus:85177209971
  • pmid:37861980
ISSN
1944-8244
DOI
10.1021/acsami.3c09863
language
English
LU publication?
yes
id
2590945a-a075-4a81-b0c1-d61a2b3aa802
date added to LUP
2023-10-30 08:59:38
date last changed
2024-04-24 09:27:25
@article{2590945a-a075-4a81-b0c1-d61a2b3aa802,
  abstract     = {{<p>The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.</p>}},
  author       = {{Esmeraldo Paiva, Aislan and Gerlt, Michael S and Läubli, Nino F and Prochukhan, Nadezda and Baez Vasquez, Jhonattan Frank and Kaminski Schierle, Gabriele S and Morris, Michael A}},
  issn         = {{1944-8244}},
  language     = {{eng}},
  month        = {{10}},
  number       = {{50}},
  pages        = {{57960--57969}},
  publisher    = {{The American Chemical Society (ACS)}},
  series       = {{ACS applied materials & interfaces}},
  title        = {{High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching}},
  url          = {{http://dx.doi.org/10.1021/acsami.3c09863}},
  doi          = {{10.1021/acsami.3c09863}},
  volume       = {{15}},
  year         = {{2023}},
}