Advanced

A comparison of thermally and photochemically cross-linked polymers for nanoimprinting

Pfeiffer, K; Reuther, F; Fink, M; Gruetzner, G; Carlberg, Patrick LU ; Maximov, Ivan LU ; Montelius, Lars LU ; Seekamp, J; Zankovych, S and Sotomayor-Torres, C M, et al. (2003) In Microelectronic Engineering 67-8. p.266-273
Abstract
The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked... (More)
The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers. (Less)
Please use this url to cite or link to this publication:
author
, et al. (More)
(Less)
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
resist, nanoimprint lithography, chemically amplified, cross-linked polymers
in
Microelectronic Engineering
volume
67-8
pages
266 - 273
publisher
Elsevier
external identifiers
  • wos:000183842100037
  • scopus:0038697349
ISSN
1873-5568
DOI
10.1016/S0167-9317(03)00079-0
language
English
LU publication?
yes
id
258d0f47-238a-40e0-9a7e-32bf22736bd7 (old id 307070)
date added to LUP
2007-08-03 15:34:07
date last changed
2018-10-03 11:29:46
@article{258d0f47-238a-40e0-9a7e-32bf22736bd7,
  abstract     = {The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers.},
  author       = {Pfeiffer, K and Reuther, F and Fink, M and Gruetzner, G and Carlberg, Patrick and Maximov, Ivan and Montelius, Lars and Seekamp, J and Zankovych, S and Sotomayor-Torres, C M and Schulz, H and Scheer, H C},
  issn         = {1873-5568},
  keyword      = {resist,nanoimprint lithography,chemically amplified,cross-linked polymers},
  language     = {eng},
  pages        = {266--273},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {A comparison of thermally and photochemically cross-linked polymers for nanoimprinting},
  url          = {http://dx.doi.org/10.1016/S0167-9317(03)00079-0},
  volume       = {67-8},
  year         = {2003},
}