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Polymer stamps for nanoimprinting

Pfeiffer, K; Fink, M; Ahrens, G; Gruetzner, G; Reuther, F; Seekamp, J; Zankovych, S; Torres, CMS; Maximov, Ivan LU and Beck, Marc LU , et al. (2002) In Microelectronic Engineering 61-2. p.393-398
Abstract
Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
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organization
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type
Contribution to journal
publication status
published
subject
keywords
crosslinked polymers, nanoimprint lithography, stamp fabrication, e-beam resist
in
Microelectronic Engineering
volume
61-2
pages
393 - 398
publisher
Elsevier
external identifiers
  • wos:000176594700052
  • scopus:0036643698
ISSN
1873-5568
DOI
10.1016/S0167-9317(02)00577-4
language
English
LU publication?
yes
id
b76203a9-d0c0-4c22-a82f-1ac637d99859 (old id 334068)
date added to LUP
2007-11-09 07:20:58
date last changed
2017-01-01 05:12:29
@article{b76203a9-d0c0-4c22-a82f-1ac637d99859,
  abstract     = {Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.},
  author       = {Pfeiffer, K and Fink, M and Ahrens, G and Gruetzner, G and Reuther, F and Seekamp, J and Zankovych, S and Torres, CMS and Maximov, Ivan and Beck, Marc and Graczyk, Mariusz and Montelius, Lars and Schulz, H and Scheer, HC and Steingrueber, F},
  issn         = {1873-5568},
  keyword      = {crosslinked polymers,nanoimprint lithography,stamp fabrication,e-beam resist},
  language     = {eng},
  pages        = {393--398},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Polymer stamps for nanoimprinting},
  url          = {http://dx.doi.org/10.1016/S0167-9317(02)00577-4},
  volume       = {61-2},
  year         = {2002},
}