Polymer stamps for nanoimprinting
(2002) In Microelectronic Engineering 61-2. p.393-398- Abstract
- Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/334068
- author
- organization
- publishing date
- 2002
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- crosslinked polymers, nanoimprint lithography, stamp fabrication, e-beam resist
- in
- Microelectronic Engineering
- volume
- 61-2
- pages
- 393 - 398
- publisher
- Elsevier
- external identifiers
-
- wos:000176594700052
- scopus:0036643698
- ISSN
- 1873-5568
- DOI
- 10.1016/S0167-9317(02)00577-4
- language
- English
- LU publication?
- yes
- id
- b76203a9-d0c0-4c22-a82f-1ac637d99859 (old id 334068)
- date added to LUP
- 2016-04-01 12:30:40
- date last changed
- 2022-01-27 06:05:20
@article{b76203a9-d0c0-4c22-a82f-1ac637d99859, abstract = {{Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.}}, author = {{Pfeiffer, K and Fink, M and Ahrens, G and Gruetzner, G and Reuther, F and Seekamp, J and Zankovych, S and Torres, CMS and Maximov, Ivan and Beck, Marc and Graczyk, Mariusz and Montelius, Lars and Schulz, H and Scheer, HC and Steingrueber, F}}, issn = {{1873-5568}}, keywords = {{crosslinked polymers; nanoimprint lithography; stamp fabrication; e-beam resist}}, language = {{eng}}, pages = {{393--398}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Polymer stamps for nanoimprinting}}, url = {{http://dx.doi.org/10.1016/S0167-9317(02)00577-4}}, doi = {{10.1016/S0167-9317(02)00577-4}}, volume = {{61-2}}, year = {{2002}}, }