Improving stamps for 10 nm level wafer scale nanoimprint lithography
(2002) In Microelectronic Engineering 61-2. p.441-448- Abstract
- The smaller the features on the stamp the more important are the interactions between stamp and polymer layer. A stamp rich in small structures will effectively show a surface area enlargement, which generally leads to adhesion of the polymer to the stamp. This makes a subsequent imprint impossible without troublesome and time-consuming cleaning. The anti-adhesion properties of Si- or SiO2-based stamps can be improved by binding fluorinated silanes covalently to the surface. In this paper, we demonstrate that the deposition procedure as well as the environment during deposition are important with respect to the quality and performance of the molecular layer. (C) 2002 Published by Elsevier Science B.V.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/334084
- author
- Beck, Marc LU ; Graczyk, Mariusz LU ; Maximov, Ivan LU ; Sarwe, Eva-Lena LU ; Ling, TGI ; Keil, M and Montelius, Lars LU
- organization
- publishing date
- 2002
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- nanoimprint lithography, stamp, fluorosilane, anti-adhesion
- in
- Microelectronic Engineering
- volume
- 61-2
- pages
- 441 - 448
- publisher
- Elsevier
- external identifiers
-
- wos:000176594700059
- scopus:0036643642
- ISSN
- 1873-5568
- DOI
- 10.1016/S0167-9317(02)00464-1
- language
- English
- LU publication?
- yes
- id
- 1ad34a26-ce29-4214-92ce-2d3e7ed93f9d (old id 334084)
- date added to LUP
- 2016-04-01 12:31:01
- date last changed
- 2022-04-05 23:27:34
@article{1ad34a26-ce29-4214-92ce-2d3e7ed93f9d, abstract = {{The smaller the features on the stamp the more important are the interactions between stamp and polymer layer. A stamp rich in small structures will effectively show a surface area enlargement, which generally leads to adhesion of the polymer to the stamp. This makes a subsequent imprint impossible without troublesome and time-consuming cleaning. The anti-adhesion properties of Si- or SiO2-based stamps can be improved by binding fluorinated silanes covalently to the surface. In this paper, we demonstrate that the deposition procedure as well as the environment during deposition are important with respect to the quality and performance of the molecular layer. (C) 2002 Published by Elsevier Science B.V.}}, author = {{Beck, Marc and Graczyk, Mariusz and Maximov, Ivan and Sarwe, Eva-Lena and Ling, TGI and Keil, M and Montelius, Lars}}, issn = {{1873-5568}}, keywords = {{nanoimprint lithography; stamp; fluorosilane; anti-adhesion}}, language = {{eng}}, pages = {{441--448}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Improving stamps for 10 nm level wafer scale nanoimprint lithography}}, url = {{http://dx.doi.org/10.1016/S0167-9317(02)00464-1}}, doi = {{10.1016/S0167-9317(02)00464-1}}, volume = {{61-2}}, year = {{2002}}, }