A 0.28-0.8 V 320 fW D-latch for Sub-VT Memories in 65 nm CMOS
(2014) FTFC- Abstract
- The design of an ultra-low-leakage latch, suitable for subthreshold standard-cell based memories in 65nm CMOS is presented. Various latch architectures are compared in terms of leakage, area and speed. The most leakage-efficient architecture is optimized by transistor stacking and channel length stretching. The final design is supplemented with a 3-state output buffer to provide low-leakage read functionality in memory applications. Silicon measurements confirm simulation results including the reliability analysis based on Monte-Carlo simulations. The latch is fully functional at 280 mV and retains data down to a supply voltage of 220mV, consuming as little as 230fW leakage power
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/4436941
- author
- Mohammadi, Babak LU ; Andersson, Oskar LU ; Meinerzhagen, Pascal ; Sherazi, Syed Muhammad Yasser LU ; Burg, Andreas and Rodrigues, Joachim LU
- organization
- publishing date
- 2014
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- [Host publication title missing]
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- conference name
- FTFC
- conference location
- Monaco
- conference dates
- 2014-05-04 - 2014-05-06
- external identifiers
-
- wos:000356507700026
- scopus:84903834605
- DOI
- 10.1109/FTFC.2014.6828618
- language
- English
- LU publication?
- yes
- id
- 7459b1a8-1e75-4ea4-8c0e-eba79c76d4f7 (old id 4436941)
- date added to LUP
- 2016-04-04 11:41:35
- date last changed
- 2025-04-04 15:13:14
@inproceedings{7459b1a8-1e75-4ea4-8c0e-eba79c76d4f7, abstract = {{The design of an ultra-low-leakage latch, suitable for subthreshold standard-cell based memories in 65nm CMOS is presented. Various latch architectures are compared in terms of leakage, area and speed. The most leakage-efficient architecture is optimized by transistor stacking and channel length stretching. The final design is supplemented with a 3-state output buffer to provide low-leakage read functionality in memory applications. Silicon measurements confirm simulation results including the reliability analysis based on Monte-Carlo simulations. The latch is fully functional at 280 mV and retains data down to a supply voltage of 220mV, consuming as little as 230fW leakage power}}, author = {{Mohammadi, Babak and Andersson, Oskar and Meinerzhagen, Pascal and Sherazi, Syed Muhammad Yasser and Burg, Andreas and Rodrigues, Joachim}}, booktitle = {{[Host publication title missing]}}, language = {{eng}}, publisher = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}}, title = {{A 0.28-0.8 V 320 fW D-latch for Sub-VT Memories in 65 nm CMOS}}, url = {{http://dx.doi.org/10.1109/FTFC.2014.6828618}}, doi = {{10.1109/FTFC.2014.6828618}}, year = {{2014}}, }