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High rate direct current reactive sputter deposition of Al2O3 - Required process parameters

Macak, Karol; Olsson, Maryam LU and Helmersson, Ulf (1997) 11th International colloquium on plasma processes In CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997 p.176-176
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author
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
in
CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997
pages
176 - 176
publisher
Société française du vide
conference name
11th International colloquium on plasma processes
external identifiers
  • Scopus:20544474791
language
English
LU publication?
no
id
12e7d268-680c-4854-a83d-5552874e6428 (old id 4645023)
date added to LUP
2014-09-10 07:49:34
date last changed
2017-01-01 08:04:44
@inproceedings{12e7d268-680c-4854-a83d-5552874e6428,
  author       = {Macak, Karol and Olsson, Maryam and Helmersson, Ulf},
  booktitle    = {CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997},
  language     = {eng},
  pages        = {176--176},
  publisher    = {Société française du vide},
  title        = {High rate direct current reactive sputter deposition of Al2O3 - Required process parameters},
  year         = {1997},
}