Modeling the morphology of self-assisted GaP nanowires grown by molecular beam epitaxy
(2018) 2018 International Conference Laser Optics, ICLO 2018 p.381-381- Abstract
 The morphologies of self-assisted GaP nanowires grown by gas source MBE in regular arrays on silicon substrates are modeled by a kinetic equation for the nanowire radius versus the position along the nanowire axis. The most important growth parameter that governs the nanowire morphology is the V/III flux ratio. Sharpened nanowires with a stable radius equal to only 12 nm at a V/III flux ratio of 6 are achieved, demonstrating their suitability for the insertion of quantum dots.
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- author
 - Leshchenko, E. D. LU ; Kuyanov, P. ; La Pierre, R. R. and Dubrovskii, V. G.
 - organization
 - publishing date
 - 2018-08
 - type
 - Chapter in Book/Report/Conference proceeding
 - publication status
 - published
 - subject
 - host publication
 - Proceedings - International Conference Laser Optics 2018, ICLO 2018
 - article number
 - 8435415
 - pages
 - 1 pages
 - publisher
 - IEEE - Institute of Electrical and Electronics Engineers Inc.
 - conference name
 - 2018 International Conference Laser Optics, ICLO 2018
 - conference location
 - St. Petersburg, Russian Federation
 - conference dates
 - 2018-06-04 - 2018-06-08
 - external identifiers
 - 
                
- scopus:85052537264
 
 - ISBN
 - 9781538636121
 - DOI
 - 10.1109/LO.2018.8435415
 - language
 - English
 - LU publication?
 - yes
 - id
 - 50f7e77d-9b6b-4760-8682-64872898df78
 - date added to LUP
 - 2022-04-01 15:40:55
 - date last changed
 - 2025-10-14 12:18:34
 
@inproceedings{50f7e77d-9b6b-4760-8682-64872898df78,
  abstract     = {{<p>The morphologies of self-assisted GaP nanowires grown by gas source MBE in regular arrays on silicon substrates are modeled by a kinetic equation for the nanowire radius versus the position along the nanowire axis. The most important growth parameter that governs the nanowire morphology is the V/III flux ratio. Sharpened nanowires with a stable radius equal to only 12 nm at a V/III flux ratio of 6 are achieved, demonstrating their suitability for the insertion of quantum dots.</p>}},
  author       = {{Leshchenko, E. D. and Kuyanov, P. and La Pierre, R. R. and Dubrovskii, V. G.}},
  booktitle    = {{Proceedings - International Conference Laser Optics 2018, ICLO 2018}},
  isbn         = {{9781538636121}},
  language     = {{eng}},
  pages        = {{381--381}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  title        = {{Modeling the morphology of self-assisted GaP nanowires grown by molecular beam epitaxy}},
  url          = {{http://dx.doi.org/10.1109/LO.2018.8435415}},
  doi          = {{10.1109/LO.2018.8435415}},
  year         = {{2018}},
}