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Electron-beam mixing of W1 - xSix Si multilayers

Vavra, I ; Wallenberg, LR LU and Kudryashov, VA (1995) In Vacuum 46(8-10). p.1063-1064
Abstract
The high energy electron beam was used for the local amorphisation of metallic multilayer. The observed effect is proposed for the application in nanometer-scale technology.
Please use this url to cite or link to this publication:
author
; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Vacuum
volume
46
issue
8-10
pages
2 pages
publisher
Elsevier
external identifiers
  • scopus:0029358019
ISSN
0042-207X
DOI
10.1016/0042-207X(95)00107-7
language
English
LU publication?
yes
id
5868c9fc-79e1-4b2d-9912-b2f986ad1025
date added to LUP
2023-10-31 15:43:57
date last changed
2023-11-07 11:54:55
@article{5868c9fc-79e1-4b2d-9912-b2f986ad1025,
  abstract     = {{The high energy electron beam was used for the local amorphisation of metallic multilayer. The observed effect is proposed for the application in nanometer-scale technology.}},
  author       = {{Vavra, I and Wallenberg, LR and Kudryashov, VA}},
  issn         = {{0042-207X}},
  language     = {{eng}},
  month        = {{08}},
  number       = {{8-10}},
  pages        = {{1063--1064}},
  publisher    = {{Elsevier}},
  series       = {{Vacuum}},
  title        = {{Electron-beam mixing of W1 - xSix Si multilayers}},
  url          = {{http://dx.doi.org/10.1016/0042-207X(95)00107-7}},
  doi          = {{10.1016/0042-207X(95)00107-7}},
  volume       = {{46}},
  year         = {{1995}},
}