Site-controlled Ge quantum dot growth on Si by the use of electron beam pre-patterning
(2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)- Abstract
- By growth of Si on substrates that have been pre-patterned by electron-beam induced carbon nano-growth masks, nano-holes form at the Si surface. We have grown self-assembled Ge quantum dots in these holes by ultra high vacuum chemical vapour phase deposition (UHV-CVD). We usually find four dots in each hole. By varying the amount of deposited Ge, we can obtain either four dome-shaped or four pyramid-shaped dots in the majority of holes. These dot arrangements could be used for the realisation of the simplest functional cell for quantum-dot cellular automata (QCA)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/610439
- author
- Borgström, Magnus LU ; Zela, Vilma LU ; Seifert, Werner LU and Samuelson, Lars LU
- organization
- publishing date
- 2002
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- site controlled Ge quantum dot growth, Si substrate, Si, electron beam prepatterning, self assembly, ultra high vacuum chemical vapour phase deposition, carbon nanogrowth masks, four pyramid shaped dots, dome shaped dots, simplest functional cell, Ge, quantum dot cellular automata
- host publication
- 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science
- pages
- 2 pages
- publisher
- Lund University
- conference name
- Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- conference location
- Malmö, Sweden
- conference dates
- 2002-06-24 - 2002-06-28
- language
- English
- LU publication?
- yes
- id
- 8a8cf8db-a44c-41d6-8e53-8c0451f53b74 (old id 610439)
- date added to LUP
- 2016-04-04 12:25:44
- date last changed
- 2018-11-21 21:10:53
@inproceedings{8a8cf8db-a44c-41d6-8e53-8c0451f53b74, abstract = {{By growth of Si on substrates that have been pre-patterned by electron-beam induced carbon nano-growth masks, nano-holes form at the Si surface. We have grown self-assembled Ge quantum dots in these holes by ultra high vacuum chemical vapour phase deposition (UHV-CVD). We usually find four dots in each hole. By varying the amount of deposited Ge, we can obtain either four dome-shaped or four pyramid-shaped dots in the majority of holes. These dot arrangements could be used for the realisation of the simplest functional cell for quantum-dot cellular automata (QCA)}}, author = {{Borgström, Magnus and Zela, Vilma and Seifert, Werner and Samuelson, Lars}}, booktitle = {{7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science}}, keywords = {{site controlled Ge quantum dot growth; Si substrate; Si; electron beam prepatterning; self assembly; ultra high vacuum chemical vapour phase deposition; carbon nanogrowth masks; four pyramid shaped dots; dome shaped dots; simplest functional cell; Ge; quantum dot cellular automata}}, language = {{eng}}, publisher = {{Lund University}}, title = {{Site-controlled Ge quantum dot growth on Si by the use of electron beam pre-patterning}}, year = {{2002}}, }