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Growth and reactivity of titanium oxide ultrathin films on Ni(110)

Papageorgiou, Anthoula Chrysa; Cabailh, Gregory; Chen, Qiao; Resta, Andrea LU ; Lundgren, Edvin LU ; Andersen, Jesper N LU and Thornton, Geoff (2007) In Journal of Physical Chemistry C 111(21). p.7704-7710
Abstract
Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar).... (More)
Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Physical Chemistry C
volume
111
issue
21
pages
7704 - 7710
publisher
The American Chemical Society
external identifiers
  • wos:000246695400023
  • scopus:34250321722
ISSN
1932-7447
DOI
10.1021/jp067802m
language
English
LU publication?
yes
id
983641d4-0209-4cbc-927b-4ea2d28d64f3 (old id 663064)
date added to LUP
2007-12-19 12:14:01
date last changed
2017-08-27 04:14:11
@article{983641d4-0209-4cbc-927b-4ea2d28d64f3,
  abstract     = {Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.},
  author       = {Papageorgiou, Anthoula Chrysa and Cabailh, Gregory and Chen, Qiao and Resta, Andrea and Lundgren, Edvin and Andersen, Jesper N and Thornton, Geoff},
  issn         = {1932-7447},
  language     = {eng},
  number       = {21},
  pages        = {7704--7710},
  publisher    = {The American Chemical Society},
  series       = {Journal of Physical Chemistry C},
  title        = {Growth and reactivity of titanium oxide ultrathin films on Ni(110)},
  url          = {http://dx.doi.org/10.1021/jp067802m},
  volume       = {111},
  year         = {2007},
}