Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

Adsorption and Reaction of CO and NO on Ir(111) under Near Ambient Pressure Conditions

Ueda, K. ; Suzuki, K. ; Toyoshima, R. ; Monya, Y. ; Yoshida, M. ; Isegawa, K. ; Amemiya, K. ; Mase, K. ; Mun, B. S. and Arman, M. A. LU , et al. (2016) In Topics in Catalysis 59(5-7). p.487-496
Abstract

The adsorption and reaction of CO and NO on Ir(111) have been studied by near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) together with low-energy electron diffraction, scanning tunneling microscopy, and mass spectroscopy (MS). Under both ultrahigh vacuum (UHV) and NAP conditions CO molecules occupy on-top sites of the Ir(111) surface at room temperature (RT) by forming two-dimensional clusters. Exposure to NO under UHV conditions at RT induces partially dissociative adsorption, while NAP NO exposure leads to a Ir(111) surface that is covered by molecular NO. We conducted in-operando NAP-XPS/MS observation of the NO + 13CO reaction under a NAP condition as a function of temperature. Below 210 °C adsorption of... (More)

The adsorption and reaction of CO and NO on Ir(111) have been studied by near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) together with low-energy electron diffraction, scanning tunneling microscopy, and mass spectroscopy (MS). Under both ultrahigh vacuum (UHV) and NAP conditions CO molecules occupy on-top sites of the Ir(111) surface at room temperature (RT) by forming two-dimensional clusters. Exposure to NO under UHV conditions at RT induces partially dissociative adsorption, while NAP NO exposure leads to a Ir(111) surface that is covered by molecular NO. We conducted in-operando NAP-XPS/MS observation of the NO + 13CO reaction under a NAP condition as a function of temperature. Below 210 °C adsorption of NO is inhibited by CO, while above 210 °C the CO inhibition is released due to partial desorption of CO and dissociative adsorption of NO starts to occur leading to associative formation of N2. Under the most active condition studied here the Ir surface is covered by a dense co-adsorption layer consisting of on-top CO, atomic N and O, which suggests that this reaction is not a NO-dissociation-limited process but a N2/CO2 formation-limited process.

(Less)
Please use this url to cite or link to this publication:
author
; ; ; ; ; ; ; ; and , et al. (More)
; ; ; ; ; ; ; ; ; ; ; ; and (Less)
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
CO adsorption, In-situ observation, Ir(111), NAP-XPS, NO + CO reaction, NO adsorption
in
Topics in Catalysis
volume
59
issue
5-7
pages
10 pages
publisher
Springer
external identifiers
  • scopus:84959479595
  • wos:000371424800008
ISSN
1022-5528
DOI
10.1007/s11244-015-0523-5
language
English
LU publication?
yes
id
72718de4-30b5-497b-b9f9-bbbe062cb138
date added to LUP
2016-09-20 07:35:43
date last changed
2024-04-19 08:47:38
@article{72718de4-30b5-497b-b9f9-bbbe062cb138,
  abstract     = {{<p>The adsorption and reaction of CO and NO on Ir(111) have been studied by near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) together with low-energy electron diffraction, scanning tunneling microscopy, and mass spectroscopy (MS). Under both ultrahigh vacuum (UHV) and NAP conditions CO molecules occupy on-top sites of the Ir(111) surface at room temperature (RT) by forming two-dimensional clusters. Exposure to NO under UHV conditions at RT induces partially dissociative adsorption, while NAP NO exposure leads to a Ir(111) surface that is covered by molecular NO. We conducted in-operando NAP-XPS/MS observation of the NO + <sup>13</sup>CO reaction under a NAP condition as a function of temperature. Below 210 °C adsorption of NO is inhibited by CO, while above 210 °C the CO inhibition is released due to partial desorption of CO and dissociative adsorption of NO starts to occur leading to associative formation of N<sub>2</sub>. Under the most active condition studied here the Ir surface is covered by a dense co-adsorption layer consisting of on-top CO, atomic N and O, which suggests that this reaction is not a NO-dissociation-limited process but a N<sub>2</sub>/CO<sub>2</sub> formation-limited process.</p>}},
  author       = {{Ueda, K. and Suzuki, K. and Toyoshima, R. and Monya, Y. and Yoshida, M. and Isegawa, K. and Amemiya, K. and Mase, K. and Mun, B. S. and Arman, M. A. and Grånäs, E. and Knudsen, J. and Schnadt, J. and Kondoh, H.}},
  issn         = {{1022-5528}},
  keywords     = {{CO adsorption; In-situ observation; Ir(111); NAP-XPS; NO + CO reaction; NO adsorption}},
  language     = {{eng}},
  month        = {{03}},
  number       = {{5-7}},
  pages        = {{487--496}},
  publisher    = {{Springer}},
  series       = {{Topics in Catalysis}},
  title        = {{Adsorption and Reaction of CO and NO on Ir(111) under Near Ambient Pressure Conditions}},
  url          = {{http://dx.doi.org/10.1007/s11244-015-0523-5}},
  doi          = {{10.1007/s11244-015-0523-5}},
  volume       = {{59}},
  year         = {{2016}},
}