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Micro-characterization and three dimensional modeling of very large waveguide arrays by selective area growth for photonic integrated circuits

Guillamet, R. ; Lagay, N. ; Mocuta, C. ; Lagrée, P. Y. ; Carbone, G. LU and Décobert, J. (2013) In Journal of Crystal Growth 370. p.128-132
Abstract

In this work, selective area growth has been used for the realization of InP based photonic integrated circuits (PICs). To predict the strain, thickness and bandgap energy variations over large and high-density multifunctional arrays, it is necessary to precisely design the shapes and positions of the dielectric masks by computational modeling. To address the mask layout density and complexity in both longitudinal and transversal direction, the use of three dimensional vapor phase model was mandatory. In each SAG region used for individual component processing, the calculated data were compared to experimental ones acquired by synchrotron-based microbeam x-ray diffraction and by micro-photoluminescence wavelength mapping. The excellent... (More)

In this work, selective area growth has been used for the realization of InP based photonic integrated circuits (PICs). To predict the strain, thickness and bandgap energy variations over large and high-density multifunctional arrays, it is necessary to precisely design the shapes and positions of the dielectric masks by computational modeling. To address the mask layout density and complexity in both longitudinal and transversal direction, the use of three dimensional vapor phase model was mandatory. In each SAG region used for individual component processing, the calculated data were compared to experimental ones acquired by synchrotron-based microbeam x-ray diffraction and by micro-photoluminescence wavelength mapping. The excellent result concordance shows that both advanced modeling and characterization techniques are of importance for PIC conception and fabrication.

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author
; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
keywords
A1. Computer simulation, A1. High resolution x-ray diffraction, A2. Selective epitaxy, B2. Semiconducting III-V materials
in
Journal of Crystal Growth
volume
370
pages
5 pages
publisher
Elsevier
external identifiers
  • scopus:84901636275
ISSN
0022-0248
DOI
10.1016/j.jcrysgro.2012.09.053
language
English
LU publication?
no
id
72a6b3ed-07f4-4e9f-a67d-dcb5c84c7b85
date added to LUP
2021-12-15 12:00:48
date last changed
2023-02-28 15:44:56
@article{72a6b3ed-07f4-4e9f-a67d-dcb5c84c7b85,
  abstract     = {{<p>In this work, selective area growth has been used for the realization of InP based photonic integrated circuits (PICs). To predict the strain, thickness and bandgap energy variations over large and high-density multifunctional arrays, it is necessary to precisely design the shapes and positions of the dielectric masks by computational modeling. To address the mask layout density and complexity in both longitudinal and transversal direction, the use of three dimensional vapor phase model was mandatory. In each SAG region used for individual component processing, the calculated data were compared to experimental ones acquired by synchrotron-based microbeam x-ray diffraction and by micro-photoluminescence wavelength mapping. The excellent result concordance shows that both advanced modeling and characterization techniques are of importance for PIC conception and fabrication.</p>}},
  author       = {{Guillamet, R. and Lagay, N. and Mocuta, C. and Lagrée, P. Y. and Carbone, G. and Décobert, J.}},
  issn         = {{0022-0248}},
  keywords     = {{A1. Computer simulation; A1. High resolution x-ray diffraction; A2. Selective epitaxy; B2. Semiconducting III-V materials}},
  language     = {{eng}},
  month        = {{05}},
  pages        = {{128--132}},
  publisher    = {{Elsevier}},
  series       = {{Journal of Crystal Growth}},
  title        = {{Micro-characterization and three dimensional modeling of very large waveguide arrays by selective area growth for photonic integrated circuits}},
  url          = {{http://dx.doi.org/10.1016/j.jcrysgro.2012.09.053}},
  doi          = {{10.1016/j.jcrysgro.2012.09.053}},
  volume       = {{370}},
  year         = {{2013}},
}