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Scanning X-ray strain microscopy of inhomogeneously strained Ge micro-bridges

Etzelstorfer, Tanja ; Süess, Martin J. ; Schiefler, Gustav L. ; Jacques, Vincent L.R. ; Carbone, Dina LU ; Chrastina, Daniel ; Isella, Giovanni ; Spolenak, Ralph ; Stangl, Julian and Sigg, Hans , et al. (2014) In Journal of Synchrotron Radiation 21(1). p.111-118
Abstract

Strained semiconductors are ubiquitous in microelectronics and microelectromechanical systems, where high local stress levels can either be detrimental for their integrity or enhance their performance. Consequently, local probes for elastic strain are essential in analyzing such devices. Here, a scanning X-ray sub-microprobe experiment for the direct measurement of deformation over large areas in single-crystal thin films with a spatial resolution close to the focused X-ray beam size is presented. By scanning regions of interest of several tens of micrometers at different rocking angles of the sample in the vicinity of two Bragg reflections, reciprocal space is effectively mapped in three dimensions at each scanning position, obtaining... (More)

Strained semiconductors are ubiquitous in microelectronics and microelectromechanical systems, where high local stress levels can either be detrimental for their integrity or enhance their performance. Consequently, local probes for elastic strain are essential in analyzing such devices. Here, a scanning X-ray sub-microprobe experiment for the direct measurement of deformation over large areas in single-crystal thin films with a spatial resolution close to the focused X-ray beam size is presented. By scanning regions of interest of several tens of micrometers at different rocking angles of the sample in the vicinity of two Bragg reflections, reciprocal space is effectively mapped in three dimensions at each scanning position, obtaining the bending, as well as the in-plane and out-of-plane strain components. Highly strained large-area Ge structures with applications in optoelectronics are used to demonstrate the potential of this technique and the results are compared with finite-element-method models for validation.

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publishing date
type
Contribution to journal
publication status
published
keywords
local probe X-ray diffraction, strain, X-ray diffraction
in
Journal of Synchrotron Radiation
volume
21
issue
1
pages
8 pages
publisher
International Union of Crystallography
external identifiers
  • scopus:84891597847
ISSN
0909-0495
DOI
10.1107/S1600577513025459
language
English
LU publication?
no
id
940c755c-3a81-4d1a-afd7-8d553d651a67
date added to LUP
2021-12-15 11:40:52
date last changed
2022-04-27 06:44:12
@article{940c755c-3a81-4d1a-afd7-8d553d651a67,
  abstract     = {{<p>Strained semiconductors are ubiquitous in microelectronics and microelectromechanical systems, where high local stress levels can either be detrimental for their integrity or enhance their performance. Consequently, local probes for elastic strain are essential in analyzing such devices. Here, a scanning X-ray sub-microprobe experiment for the direct measurement of deformation over large areas in single-crystal thin films with a spatial resolution close to the focused X-ray beam size is presented. By scanning regions of interest of several tens of micrometers at different rocking angles of the sample in the vicinity of two Bragg reflections, reciprocal space is effectively mapped in three dimensions at each scanning position, obtaining the bending, as well as the in-plane and out-of-plane strain components. Highly strained large-area Ge structures with applications in optoelectronics are used to demonstrate the potential of this technique and the results are compared with finite-element-method models for validation.</p>}},
  author       = {{Etzelstorfer, Tanja and Süess, Martin J. and Schiefler, Gustav L. and Jacques, Vincent L.R. and Carbone, Dina and Chrastina, Daniel and Isella, Giovanni and Spolenak, Ralph and Stangl, Julian and Sigg, Hans and Diaz, Ana}},
  issn         = {{0909-0495}},
  keywords     = {{local probe X-ray diffraction; strain; X-ray diffraction}},
  language     = {{eng}},
  number       = {{1}},
  pages        = {{111--118}},
  publisher    = {{International Union of Crystallography}},
  series       = {{Journal of Synchrotron Radiation}},
  title        = {{Scanning X-ray strain microscopy of inhomogeneously strained Ge micro-bridges}},
  url          = {{http://dx.doi.org/10.1107/S1600577513025459}},
  doi          = {{10.1107/S1600577513025459}},
  volume       = {{21}},
  year         = {{2014}},
}