Growth and reactivity of titanium oxide ultrathin films on Ni(110)
(2007) In Journal of Physical Chemistry C 111(21). p.7704-7710- Abstract
- Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar).... (More)
- Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/663064
- author
- Papageorgiou, Anthoula Chrysa ; Cabailh, Gregory ; Chen, Qiao ; Resta, Andrea LU ; Lundgren, Edvin LU ; Andersen, Jesper N LU and Thornton, Geoff
- organization
- publishing date
- 2007
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Physical Chemistry C
- volume
- 111
- issue
- 21
- pages
- 7704 - 7710
- publisher
- The American Chemical Society (ACS)
- external identifiers
-
- wos:000246695400023
- scopus:34250321722
- ISSN
- 1932-7447
- DOI
- 10.1021/jp067802m
- language
- English
- LU publication?
- yes
- id
- 983641d4-0209-4cbc-927b-4ea2d28d64f3 (old id 663064)
- date added to LUP
- 2016-04-01 12:18:42
- date last changed
- 2022-03-28 23:07:57
@article{983641d4-0209-4cbc-927b-4ea2d28d64f3,
abstract = {{Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.}},
author = {{Papageorgiou, Anthoula Chrysa and Cabailh, Gregory and Chen, Qiao and Resta, Andrea and Lundgren, Edvin and Andersen, Jesper N and Thornton, Geoff}},
issn = {{1932-7447}},
language = {{eng}},
number = {{21}},
pages = {{7704--7710}},
publisher = {{The American Chemical Society (ACS)}},
series = {{Journal of Physical Chemistry C}},
title = {{Growth and reactivity of titanium oxide ultrathin films on Ni(110)}},
url = {{http://dx.doi.org/10.1021/jp067802m}},
doi = {{10.1021/jp067802m}},
volume = {{111}},
year = {{2007}},
}