Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

Whitlow, Harry J LU ; Ng, May Ling LU ; Auzelyte, Vaida LU ; Maximov, Ivan LU orcid ; Montelius, Lars LU ; van Kan, JA ; Bettiol, AA and Watt, F (2004) In Nanotechnology 15(1). p.223-226
Abstract
Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Please use this url to cite or link to this publication:
author
; ; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Nanotechnology
volume
15
issue
1
pages
223 - 226
publisher
IOP Publishing
external identifiers
  • wos:000188463600041
  • scopus:0742301759
ISSN
0957-4484
DOI
10.1088/0957-4484/15/1/040
language
Romanian
LU publication?
yes
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Solid State Physics (011013006), Nuclear Physics (Faculty of Technology) (011013007), Max-laboratory (011012005)
id
a8c53c92-76a9-4a75-ae9f-b4b3948622ff (old id 288968)
date added to LUP
2016-04-01 12:15:35
date last changed
2025-10-14 10:20:10
@article{a8c53c92-76a9-4a75-ae9f-b4b3948622ff,
  abstract     = {{Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.}},
  author       = {{Whitlow, Harry J and Ng, May Ling and Auzelyte, Vaida and Maximov, Ivan and Montelius, Lars and van Kan, JA and Bettiol, AA and Watt, F}},
  issn         = {{0957-4484}},
  language     = {{rum}},
  number       = {{1}},
  pages        = {{223--226}},
  publisher    = {{IOP Publishing}},
  series       = {{Nanotechnology}},
  title        = {{Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect}},
  url          = {{http://dx.doi.org/10.1088/0957-4484/15/1/040}},
  doi          = {{10.1088/0957-4484/15/1/040}},
  volume       = {{15}},
  year         = {{2004}},
}