Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate
(2011) In Microelectronic Engineering 88(10). p.3108-3112- Abstract
- In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/2291710
- author
- Meng, Fantao ; Luo, Gang LU ; Maximov, Ivan LU ; Montelius, Lars LU ; Chu, Jinkui and Xu, Hongqi LU
- organization
- publishing date
- 2011
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Bilayer wire-grid polarizer, Nanoimprint lithography, Flexible plastic, substrate, TM transmission, Extinction ratio
- in
- Microelectronic Engineering
- volume
- 88
- issue
- 10
- pages
- 3108 - 3112
- publisher
- Elsevier
- external identifiers
-
- wos:000297400900011
- scopus:80052817630
- ISSN
- 1873-5568
- DOI
- 10.1016/j.mee.2011.06.008
- language
- English
- LU publication?
- yes
- id
- bd02b27b-d6fa-47e8-a21e-620646644d62 (old id 2291710)
- date added to LUP
- 2016-04-01 10:13:21
- date last changed
- 2023-09-13 20:52:33
@article{bd02b27b-d6fa-47e8-a21e-620646644d62, abstract = {{In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.}}, author = {{Meng, Fantao and Luo, Gang and Maximov, Ivan and Montelius, Lars and Chu, Jinkui and Xu, Hongqi}}, issn = {{1873-5568}}, keywords = {{Bilayer wire-grid polarizer; Nanoimprint lithography; Flexible plastic; substrate; TM transmission; Extinction ratio}}, language = {{eng}}, number = {{10}}, pages = {{3108--3112}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate}}, url = {{http://dx.doi.org/10.1016/j.mee.2011.06.008}}, doi = {{10.1016/j.mee.2011.06.008}}, volume = {{88}}, year = {{2011}}, }