Fluorescence microscopy for quality control in nanoimprint lithography
(2003) 28th International Conference on Micro- and Nano-Engineering, 2002 67-8. p.623-628- Abstract
- Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 mum lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-18000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was... (More)
- Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 mum lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-18000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process. (C) 2003 Elsevier Science B.V. All rights reserved. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/307083
- author
- organization
- publishing date
- 2003
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- stamp, quality control, fluorescence microscopy, nanoimprint lithography, polymer
- host publication
- Microelectronic Engineering (Proceedings of the 28th International Conference on Micro- and Nano-Engineering)
- volume
- 67-8
- pages
- 623 - 628
- publisher
- Elsevier
- conference name
- 28th International Conference on Micro- and Nano-Engineering, 2002
- conference location
- Lugano, Switzerland
- conference dates
- 2002-09-16 - 2002-09-19
- external identifiers
-
- wos:000183842100085
- scopus:0038020122
- ISSN
- 0167-9317
- 1873-5568
- DOI
- 10.1016/S0167-9317(03)00123-0
- language
- English
- LU publication?
- yes
- id
- cbdfadc7-c7bb-44c1-9762-d6ccbf3c2d9b (old id 307083)
- date added to LUP
- 2016-04-01 11:55:36
- date last changed
- 2024-01-08 01:43:43
@inproceedings{cbdfadc7-c7bb-44c1-9762-d6ccbf3c2d9b,
abstract = {{Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 mum lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-18000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process. (C) 2003 Elsevier Science B.V. All rights reserved.}},
author = {{Finder, C and Beck, Marc and Seekamp, J and Pfeiffer, K and Carlberg, P and Maximov, Ivan and Reuther, F and Sarwe, Eva-Lena and Zankovich, S and Ahopelto, J and Montelius, Lars and Mayer, C and Torres, CMS}},
booktitle = {{Microelectronic Engineering (Proceedings of the 28th International Conference on Micro- and Nano-Engineering)}},
issn = {{0167-9317}},
keywords = {{stamp; quality control; fluorescence microscopy; nanoimprint lithography; polymer}},
language = {{eng}},
pages = {{623--628}},
publisher = {{Elsevier}},
title = {{Fluorescence microscopy for quality control in nanoimprint lithography}},
url = {{http://dx.doi.org/10.1016/S0167-9317(03)00123-0}},
doi = {{10.1016/S0167-9317(03)00123-0}},
volume = {{67-8}},
year = {{2003}},
}