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Defect-driven antiferromagnetic domain walls in CuMnAs films

Reimers, Sonka ; Kriegner, Dominik ; Gomonay, Olena ; Carbone, Dina LU ; Krizek, Filip ; Novák, Vit ; Campion, Richard P. ; MacCherozzi, Francesco ; Björling, Alexander LU and Amin, Oliver J. , et al. (2023) 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 In 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings
Abstract

Antiferromagnetic (AF) materials offer a route to realising high-speed, high-density data storage devices that are robust against magnetic fields due to their intrinsic dynamics in the THz-regime and the lack magnetic stray fields. The key to functionality and efficiency is the control of AF domains and domain walls. Although AF domain structures are known to be sensitive to magnetoelastic effects, the microscopic interplay of crystalline defects, strain and magnetic ordering remains largely unknown. Here, we reveal, using photoemission electron microscopy combined with scanning x-ray diffraction microscopy and micromagnetic simulations, that the AF domain structure in CuMnAs thin films is dominated by nanoscale structural twin defects,... (More)

Antiferromagnetic (AF) materials offer a route to realising high-speed, high-density data storage devices that are robust against magnetic fields due to their intrinsic dynamics in the THz-regime and the lack magnetic stray fields. The key to functionality and efficiency is the control of AF domains and domain walls. Although AF domain structures are known to be sensitive to magnetoelastic effects, the microscopic interplay of crystalline defects, strain and magnetic ordering remains largely unknown. Here, we reveal, using photoemission electron microscopy combined with scanning x-ray diffraction microscopy and micromagnetic simulations, that the AF domain structure in CuMnAs thin films is dominated by nanoscale structural twin defects, which determine the location and orientation of 180° and 90° domain walls. The results emphasise the high sensitivity of the AF domain structure to the crystallographic nanostructure and provide a route to optimisng device performance.

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organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Antiferromagnetism, Domain Walls, Photoemission Electron Microscopy, Scanning X-ray Diffraction Microscopy
host publication
2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings
series title
2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings
publisher
IEEE - Institute of Electrical and Electronics Engineers Inc.
conference name
2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023
conference location
Sendai, Japan
conference dates
2023-05-15 - 2023-05-19
external identifiers
  • scopus:85172727744
ISBN
9798350338362
DOI
10.1109/INTERMAGShortPapers58606.2023.10228289
language
English
LU publication?
yes
id
d01614d9-7c2a-47b2-9f19-0551325b56ca
date added to LUP
2024-01-12 12:42:50
date last changed
2024-01-12 12:44:39
@inproceedings{d01614d9-7c2a-47b2-9f19-0551325b56ca,
  abstract     = {{<p>Antiferromagnetic (AF) materials offer a route to realising high-speed, high-density data storage devices that are robust against magnetic fields due to their intrinsic dynamics in the THz-regime and the lack magnetic stray fields. The key to functionality and efficiency is the control of AF domains and domain walls. Although AF domain structures are known to be sensitive to magnetoelastic effects, the microscopic interplay of crystalline defects, strain and magnetic ordering remains largely unknown. Here, we reveal, using photoemission electron microscopy combined with scanning x-ray diffraction microscopy and micromagnetic simulations, that the AF domain structure in CuMnAs thin films is dominated by nanoscale structural twin defects, which determine the location and orientation of 180° and 90° domain walls. The results emphasise the high sensitivity of the AF domain structure to the crystallographic nanostructure and provide a route to optimisng device performance.</p>}},
  author       = {{Reimers, Sonka and Kriegner, Dominik and Gomonay, Olena and Carbone, Dina and Krizek, Filip and Novák, Vit and Campion, Richard P. and MacCherozzi, Francesco and Björling, Alexander and Amin, Oliver J. and Barton, Luke X. and Poole, Stuart F. and Omari, Khalid A. and Michalička, Jan and Man, Ondřej and Sinova, Jairo and Jungwirth, Tomáš and Wadley, Peter and Dhesi, Sarnjeet S. and Edmonds, Kevin W.}},
  booktitle    = {{2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings}},
  isbn         = {{9798350338362}},
  keywords     = {{Antiferromagnetism; Domain Walls; Photoemission Electron Microscopy; Scanning X-ray Diffraction Microscopy}},
  language     = {{eng}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  series       = {{2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings}},
  title        = {{Defect-driven antiferromagnetic domain walls in CuMnAs films}},
  url          = {{http://dx.doi.org/10.1109/INTERMAGShortPapers58606.2023.10228289}},
  doi          = {{10.1109/INTERMAGShortPapers58606.2023.10228289}},
  year         = {{2023}},
}