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Structural and electrical properties of superconducting Nb/Si multilayers

Vavra, I ; Lobotka, P ; Derer, J and Wallenberg, LR LU (1998) In Vacuum 50(1-2). p.31-33
Abstract
We have found the deposition technology at which the interface roughness of Nb/Si multilayer is strongly correlated and decreases with deposited layer number. On the basis of our Nb/Si multilayer we succeeded to prepare ten-fold stacked Josephson junction (JJ). Basic electric properties of stacked JJ are presented.
Please use this url to cite or link to this publication:
author
; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Vacuum
volume
50
issue
1-2
pages
3 pages
publisher
Elsevier
external identifiers
  • scopus:0032058343
ISSN
0042-207X
DOI
10.1016/S0042-207X(98)00009-8
language
English
LU publication?
yes
id
df6fa054-6224-4846-9762-b9e219abc604
date added to LUP
2023-10-31 16:05:20
date last changed
2023-11-02 15:12:43
@article{df6fa054-6224-4846-9762-b9e219abc604,
  abstract     = {{We have found the deposition technology at which the interface roughness of Nb/Si multilayer is strongly correlated and decreases with deposited layer number. On the basis of our Nb/Si multilayer we succeeded to prepare ten-fold stacked Josephson junction (JJ). Basic electric properties of stacked JJ are presented.}},
  author       = {{Vavra, I and Lobotka, P and Derer, J and Wallenberg, LR}},
  issn         = {{0042-207X}},
  language     = {{eng}},
  month        = {{05}},
  number       = {{1-2}},
  pages        = {{31--33}},
  publisher    = {{Elsevier}},
  series       = {{Vacuum}},
  title        = {{Structural and electrical properties of superconducting Nb/Si multilayers}},
  url          = {{http://dx.doi.org/10.1016/S0042-207X(98)00009-8}},
  doi          = {{10.1016/S0042-207X(98)00009-8}},
  volume       = {{50}},
  year         = {{1998}},
}