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2005
Mark An alignment procedure for nanoimprint lithography at the sub-20 nm level
Adolph, David ^LU ; Bolmsjö, E ; Theander, Elke ^LU ; Saers, R ; Graczyk, Mariusz ^LU ; Hessman, Dan ^LU ; Maximov, Ivan ^LU ; Andersson-Engels, Stefan ^LU ; Persson, Anders ^LU and Wahlström, Claes-Göran ^LU , et al. (2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding