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- 2002
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Mark
Nanoimprint lithography: opportunities and applications
2002) Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference p.18-19(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
New high resolution negative resist mr-L 6000.1 XP for electron beam and nanoimprint lithography
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Nanoimprint in mr-L 6000.1 XP/PMMA resist system
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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