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- 2004
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Mark
Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
(
- Contribution to journal › Article
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Mark
Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
2004) 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding