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- 2022
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Mark
Laminated HZO on InAs: A study of as-deposited ferroelectricity
(
- Master (Two yrs)
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Mark
Analysis of condition for ALD deposition of ferroelectric HZO
(
- Master (Two yrs)
- 2020
-
Mark
HfO2 and ITO Resistive Random-Access Memory
(
- Master (Two yrs)
- 2019
-
Mark
Ferroelectric Gate-Stack on InAs
(
- Master (Two yrs)
- 2017
-
Mark
Simulation and TLM studies of vertical nanowire devices
(
- Master (One yr)
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Mark
Fabrication and Charaterisation of Finger Gates
(
- Master (Two yrs)
- 2016
-
Mark
Effect of active load on III-V NWFET Double-Balanced Gilbert Cells
(
- Master (Two yrs)
-
Mark
Vertical heterostructure III-V nanowire MOSFETs
2016) In Vertical heterostructure III-V nanowire MOSFETs EITM01 20161(
Department of Electrical and Information Technology- Master (Two yrs)
-
Mark
Electro-optical characterization of BaTiO3 based active photonic devices on silicon
(
- Master (Two yrs)
-
Mark
InAs MOS capacitors;Fabrication & Characterization
(
- Bach. Degree