Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography
(2005) In Journal of Vacuum Science and Technology B 23(6). p.2944-2949- Abstract
- We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are... (More)
- We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/209825
- author
- Bilenberg, B ; Hansen, M ; Johansen, D ; Ozkapici, V ; Jeppesen, C ; Szabo, P ; Obieta, I M ; Arroyo, O ; Tegenfeldt, Jonas LU and Kristensen, A
- organization
- publishing date
- 2005
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Vacuum Science and Technology B
- volume
- 23
- issue
- 6
- pages
- 2944 - 2949
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- wos:000234613200129
- scopus:29044433915
- ISSN
- 1520-8567
- DOI
- 10.1116/1.2091089
- language
- English
- LU publication?
- yes
- id
- 59add5b3-3226-47b6-b47b-ae5539e9b34b (old id 209825)
- date added to LUP
- 2016-04-01 12:07:52
- date last changed
- 2022-04-13 06:32:42
@article{59add5b3-3226-47b6-b47b-ae5539e9b34b, abstract = {{We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.}}, author = {{Bilenberg, B and Hansen, M and Johansen, D and Ozkapici, V and Jeppesen, C and Szabo, P and Obieta, I M and Arroyo, O and Tegenfeldt, Jonas and Kristensen, A}}, issn = {{1520-8567}}, language = {{eng}}, number = {{6}}, pages = {{2944--2949}}, publisher = {{American Institute of Physics (AIP)}}, series = {{Journal of Vacuum Science and Technology B}}, title = {{Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography}}, url = {{http://dx.doi.org/10.1116/1.2091089}}, doi = {{10.1116/1.2091089}}, volume = {{23}}, year = {{2005}}, }