Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
(2004) In Nanotechnology 15(1). p.223-226- Abstract
- Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/288968
- author
- Whitlow, Harry J LU ; Ng, May Ling LU ; Auzelyte, Vaida LU ; Maximov, Ivan LU ; Montelius, Lars LU ; van Kan, JA ; Bettiol, AA and Watt, F
- organization
- publishing date
- 2004
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Nanotechnology
- volume
- 15
- issue
- 1
- pages
- 223 - 226
- publisher
- IOP Publishing
- external identifiers
-
- wos:000188463600041
- scopus:0742301759
- ISSN
- 0957-4484
- DOI
- 10.1088/0957-4484/15/1/040
- language
- Romanian
- LU publication?
- yes
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Solid State Physics (011013006), Nuclear Physics (Faculty of Technology) (011013007), Max-laboratory (011012005)
- id
- a8c53c92-76a9-4a75-ae9f-b4b3948622ff (old id 288968)
- date added to LUP
- 2016-04-01 12:15:35
- date last changed
- 2022-01-27 01:06:31
@article{a8c53c92-76a9-4a75-ae9f-b4b3948622ff, abstract = {{Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.}}, author = {{Whitlow, Harry J and Ng, May Ling and Auzelyte, Vaida and Maximov, Ivan and Montelius, Lars and van Kan, JA and Bettiol, AA and Watt, F}}, issn = {{0957-4484}}, language = {{rum}}, number = {{1}}, pages = {{223--226}}, publisher = {{IOP Publishing}}, series = {{Nanotechnology}}, title = {{Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect}}, url = {{http://dx.doi.org/10.1088/0957-4484/15/1/040}}, doi = {{10.1088/0957-4484/15/1/040}}, volume = {{15}}, year = {{2004}}, }