Liquid-target laser-plasma source for X-ray lithography
(1997) In Microelectronic Engineering 35(1-4). p.535-536- Abstract
- We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/2258943
- author
- Malmqvist, L ; Bogdanov, A. L ; Montelius, Lars LU and Hertz, H. M
- organization
- publishing date
- 1997
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Microelectronic Engineering
- volume
- 35
- issue
- 1-4
- pages
- 535 - 536
- publisher
- Elsevier
- external identifiers
-
- scopus:0031073867
- ISSN
- 1873-5568
- DOI
- 10.1016/S0167-9317(97)87391-1
- language
- English
- LU publication?
- yes
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Atomic physics (011013005), Physics, Faculty of Technology (011013200)
- id
- 2d15258f-f5e8-4855-9ede-58235d6c2603 (old id 2258943)
- date added to LUP
- 2016-04-04 08:33:10
- date last changed
- 2022-01-29 03:32:16
@article{2d15258f-f5e8-4855-9ede-58235d6c2603, abstract = {{We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.}}, author = {{Malmqvist, L and Bogdanov, A. L and Montelius, Lars and Hertz, H. M}}, issn = {{1873-5568}}, language = {{eng}}, number = {{1-4}}, pages = {{535--536}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Liquid-target laser-plasma source for X-ray lithography}}, url = {{https://lup.lub.lu.se/search/files/5183435/2297447.pdf}}, doi = {{10.1016/S0167-9317(97)87391-1}}, volume = {{35}}, year = {{1997}}, }