Si measurements : SiOx on Si
(2017) 2017 Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 p.235-238- Abstract
We review the results of silicon measurements, which we have performed on suboxide SiOx formed on n and p type Si wafers with different surface textures. Localized vibrational modes through Raman and FTIR, light emission properties by photoluminescence (PL), energy critical points for optical transitions, excited state dynamics and non-linear electrical properties can be used as effective methods in investigating thin oxide layers on Si. Infrared vibrational spectrum of Si-O-Si bondings in terms of transverse-optic (TO) and longitudinal-optic (LO) phonons indicating that disorder induced LO-TO optical mode coupling can be an effective tool in assessing the structural quality of the SiOx. Excited carrier dynamics and switching... (More)
We review the results of silicon measurements, which we have performed on suboxide SiOx formed on n and p type Si wafers with different surface textures. Localized vibrational modes through Raman and FTIR, light emission properties by photoluminescence (PL), energy critical points for optical transitions, excited state dynamics and non-linear electrical properties can be used as effective methods in investigating thin oxide layers on Si. Infrared vibrational spectrum of Si-O-Si bondings in terms of transverse-optic (TO) and longitudinal-optic (LO) phonons indicating that disorder induced LO-TO optical mode coupling can be an effective tool in assessing the structural quality of the SiOx. Excited carrier dynamics and switching mechanisms can provide critical information about electronic quality of sub oxides for applications in CMOS circuits.
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- author
- Kalem, S. ; Tekin, S. B. ; Kaya, Z. E. ; Hannas, A. E. and Sundström, Villy LU
- organization
- publishing date
- 2017-06-29
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- electrical and optical methods, ellipsometry, FDSOI, photoluminescence, SiO on Si
- host publication
- Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 - Proceedings
- article number
- 7962571
- pages
- 4 pages
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- conference name
- 2017 Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017
- conference location
- Athens, Greece
- conference dates
- 2017-04-03 - 2017-04-05
- external identifiers
-
- scopus:85026747893
- ISSN
- 2472-9132
- ISBN
- 9781509053131
- DOI
- 10.1109/ULIS.2017.7962571
- language
- English
- LU publication?
- yes
- id
- 70445c2c-bec9-4102-83d4-2cf8478f216c
- date added to LUP
- 2017-09-01 13:02:52
- date last changed
- 2022-04-25 02:16:12
@inproceedings{70445c2c-bec9-4102-83d4-2cf8478f216c, abstract = {{<p>We review the results of silicon measurements, which we have performed on suboxide SiO<sub>x</sub> formed on n and p type Si wafers with different surface textures. Localized vibrational modes through Raman and FTIR, light emission properties by photoluminescence (PL), energy critical points for optical transitions, excited state dynamics and non-linear electrical properties can be used as effective methods in investigating thin oxide layers on Si. Infrared vibrational spectrum of Si-O-Si bondings in terms of transverse-optic (TO) and longitudinal-optic (LO) phonons indicating that disorder induced LO-TO optical mode coupling can be an effective tool in assessing the structural quality of the SiOx. Excited carrier dynamics and switching mechanisms can provide critical information about electronic quality of sub oxides for applications in CMOS circuits.</p>}}, author = {{Kalem, S. and Tekin, S. B. and Kaya, Z. E. and Hannas, A. E. and Sundström, Villy}}, booktitle = {{Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 - Proceedings}}, isbn = {{9781509053131}}, issn = {{2472-9132}}, keywords = {{electrical and optical methods; ellipsometry; FDSOI; photoluminescence; SiO on Si}}, language = {{eng}}, month = {{06}}, pages = {{235--238}}, publisher = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}}, title = {{Si measurements : SiO<sub>x</sub> on Si}}, url = {{http://dx.doi.org/10.1109/ULIS.2017.7962571}}, doi = {{10.1109/ULIS.2017.7962571}}, year = {{2017}}, }