Sharp microfaceting of (001)-oriented cerium dioxide thin films and the effect of annealing on surface morphology
(1999) In Surface Science 429(1-3). p.22-33- Abstract
- Cerium dioxide, CeO2, is a chemically stable oxygen-ion-conducting material, which has been extensively used as an additive or support in oxidation catalysts. The fact that catalytic behaviour is often surface structure sensitive and/or edge atom dependent suggests that different surfaces might be discernible in associated redox processes. Thus, it is desirable to realise CeO2 films with a well-defined microstructure and with crystallographically uniform surfaces. In this paper we present evidence of extremely sharp microfaceting on the surface of thin CeO2 films grown by r.f. magnetron sputtering, and the effect of annealing on the formed sharp ridges. The results show that nominally designated crystallographic surfaces may in fact not... (More)
- Cerium dioxide, CeO2, is a chemically stable oxygen-ion-conducting material, which has been extensively used as an additive or support in oxidation catalysts. The fact that catalytic behaviour is often surface structure sensitive and/or edge atom dependent suggests that different surfaces might be discernible in associated redox processes. Thus, it is desirable to realise CeO2 films with a well-defined microstructure and with crystallographically uniform surfaces. In this paper we present evidence of extremely sharp microfaceting on the surface of thin CeO2 films grown by r.f. magnetron sputtering, and the effect of annealing on the formed sharp ridges. The results show that nominally designated crystallographic surfaces may in fact not coincide with the surfaces exposed as-grown. Thus, there is a clear risk for erroneous interpretation of various orientation-dependent surface properties. Carefully controlled annealing of these films can be utilised as a method for tailoring the resulting surface morphology on the atomic scale. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/96532458-3cff-4bd2-be0d-0072550cec69
- author
- Jacobsen, SN ; Helmersson, U ; Erlandsson, R ; Skårman, B LU and Wallenberg, LR LU
- organization
- publishing date
- 1999-06-10
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- atomic force microscopy (AFM), cerium dioxide, faceting, polycrystalline surfaces, scanning electron microscopy (SEM), surface structure morphology roughness and topography, transmission electron microscopy (TEM)
- in
- Surface Science
- volume
- 429
- issue
- 1-3
- pages
- 12 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:0032651537
- ISSN
- 0039-6028
- DOI
- 10.1016/S0039-6028(99)00320-9
- language
- English
- LU publication?
- yes
- id
- 96532458-3cff-4bd2-be0d-0072550cec69
- date added to LUP
- 2023-10-31 16:17:11
- date last changed
- 2023-11-02 13:54:47
@article{96532458-3cff-4bd2-be0d-0072550cec69, abstract = {{Cerium dioxide, CeO2, is a chemically stable oxygen-ion-conducting material, which has been extensively used as an additive or support in oxidation catalysts. The fact that catalytic behaviour is often surface structure sensitive and/or edge atom dependent suggests that different surfaces might be discernible in associated redox processes. Thus, it is desirable to realise CeO2 films with a well-defined microstructure and with crystallographically uniform surfaces. In this paper we present evidence of extremely sharp microfaceting on the surface of thin CeO2 films grown by r.f. magnetron sputtering, and the effect of annealing on the formed sharp ridges. The results show that nominally designated crystallographic surfaces may in fact not coincide with the surfaces exposed as-grown. Thus, there is a clear risk for erroneous interpretation of various orientation-dependent surface properties. Carefully controlled annealing of these films can be utilised as a method for tailoring the resulting surface morphology on the atomic scale.}}, author = {{Jacobsen, SN and Helmersson, U and Erlandsson, R and Skårman, B and Wallenberg, LR}}, issn = {{0039-6028}}, keywords = {{atomic force microscopy (AFM); cerium dioxide; faceting; polycrystalline surfaces; scanning electron microscopy (SEM); surface structure morphology roughness and topography; transmission electron microscopy (TEM)}}, language = {{eng}}, month = {{06}}, number = {{1-3}}, pages = {{22--33}}, publisher = {{Elsevier}}, series = {{Surface Science}}, title = {{Sharp microfaceting of (001)-oriented cerium dioxide thin films and the effect of annealing on surface morphology}}, url = {{http://dx.doi.org/10.1016/S0039-6028(99)00320-9}}, doi = {{10.1016/S0039-6028(99)00320-9}}, volume = {{429}}, year = {{1999}}, }