Planar refractive lenses made of SiC for high intensity nanofocusing
(2021) In Optics Express 29(9). p.14025-14032- Abstract
- We report on the manufacturing and testing of the first nanofocusing refractive lenses made of single-crystal silicon carbide. We introduce the fabrication process based on lithography, followed by deep isotropic etching. The lenses were characterized at the energy of 12 keV at the beamline P06 of the synchrotron radiation source PETRA III. A focal spot of 186 nm x 275 nm has been achieved with a lens working distance of 29 mm.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/02d998c5-d1b2-4900-b9b5-c6682c725d27
- author
- Lyubomirskiy, Mikhail ; Schurink, Bart ; Makhotkin, Igor A. ; Brueckner, Dennis ; Wittwer, Felix ; Kahnt, Maik LU ; Seyrich, Martin ; Seiboth, Frank ; Bijkerk, Fred and Schroer, Christian G.
- organization
- publishing date
- 2021-04-26
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Hard x rays, Planar lenses, Synchrotron radiation, X ray diffraction, X ray microscopy, X ray optics
- in
- Optics Express
- volume
- 29
- issue
- 9
- pages
- 8 pages
- publisher
- Optical Society of America
- external identifiers
-
- scopus:85105077232
- pmid:33985128
- ISSN
- 1094-4087
- DOI
- 10.1364/OE.416223
- language
- English
- LU publication?
- yes
- id
- 02d998c5-d1b2-4900-b9b5-c6682c725d27
- date added to LUP
- 2021-05-03 10:08:23
- date last changed
- 2023-11-23 02:11:19
@article{02d998c5-d1b2-4900-b9b5-c6682c725d27, abstract = {{We report on the manufacturing and testing of the first nanofocusing refractive lenses made of single-crystal silicon carbide. We introduce the fabrication process based on lithography, followed by deep isotropic etching. The lenses were characterized at the energy of 12 keV at the beamline P06 of the synchrotron radiation source PETRA III. A focal spot of 186 nm x 275 nm has been achieved with a lens working distance of 29 mm.}}, author = {{Lyubomirskiy, Mikhail and Schurink, Bart and Makhotkin, Igor A. and Brueckner, Dennis and Wittwer, Felix and Kahnt, Maik and Seyrich, Martin and Seiboth, Frank and Bijkerk, Fred and Schroer, Christian G.}}, issn = {{1094-4087}}, keywords = {{Hard x rays; Planar lenses; Synchrotron radiation; X ray diffraction; X ray microscopy; X ray optics}}, language = {{eng}}, month = {{04}}, number = {{9}}, pages = {{14025--14032}}, publisher = {{Optical Society of America}}, series = {{Optics Express}}, title = {{Planar refractive lenses made of SiC for high intensity nanofocusing}}, url = {{http://dx.doi.org/10.1364/OE.416223}}, doi = {{10.1364/OE.416223}}, volume = {{29}}, year = {{2021}}, }