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Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

Skjolding, Lars Henrik LU ; Turon Teixidor, Genis LU ; Emnéus, Jenny LU and Montelius, Lars LU (2009) 34th International Conference on Micro- and Nano-Engineering 86(4-6). p.654-656
Abstract
This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
Please use this url to cite or link to this publication:
author
; ; and
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Interdigitated electrodes, Alignment strategy, Mix-and-match lithography, UV lithography, NIL, SU-8 2005
host publication
Microelectronic Engineering
volume
86
issue
4-6
pages
654 - 656
publisher
Elsevier
conference name
34th International Conference on Micro- and Nano-Engineering
conference location
Athens, Greece
conference dates
2008-09-15 - 2008-09-18
external identifiers
  • wos:000267273300051
  • scopus:67349089011
ISSN
1873-5568
0167-9317
DOI
10.1016/j.mee.2008.12.077
language
English
LU publication?
yes
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Solid State Physics (011013006), Analytical Chemistry (S/LTH) (011001004)
id
c1fa7d1c-18cb-4acc-8ef5-4593eb114a61 (old id 1300016)
date added to LUP
2016-04-01 12:26:35
date last changed
2025-01-02 18:08:06
@inproceedings{c1fa7d1c-18cb-4acc-8ef5-4593eb114a61,
  abstract     = {{This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.}},
  author       = {{Skjolding, Lars Henrik and Turon Teixidor, Genis and Emnéus, Jenny and Montelius, Lars}},
  booktitle    = {{Microelectronic Engineering}},
  issn         = {{1873-5568}},
  keywords     = {{Interdigitated electrodes; Alignment strategy; Mix-and-match lithography; UV lithography; NIL; SU-8 2005}},
  language     = {{eng}},
  number       = {{4-6}},
  pages        = {{654--656}},
  publisher    = {{Elsevier}},
  title        = {{Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures}},
  url          = {{http://dx.doi.org/10.1016/j.mee.2008.12.077}},
  doi          = {{10.1016/j.mee.2008.12.077}},
  volume       = {{86}},
  year         = {{2009}},
}