Advanced

Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

Skjolding, Lars Henrik LU ; Turon Teixidor, Genis LU ; Emnéus, Jenny LU and Montelius, Lars LU (2009) 34th International Conference on Micro- and Nano-Engineering In Microelectronic Engineering 86(4-6). p.654-656
Abstract
This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Interdigitated electrodes, Alignment strategy, Mix-and-match lithography, UV lithography, NIL, SU-8 2005
in
Microelectronic Engineering
volume
86
issue
4-6
pages
654 - 656
publisher
Elsevier
conference name
34th International Conference on Micro- and Nano-Engineering
external identifiers
  • wos:000267273300051
  • scopus:67349089011
ISSN
1873-5568
0167-9317
DOI
10.1016/j.mee.2008.12.077
language
English
LU publication?
yes
id
c1fa7d1c-18cb-4acc-8ef5-4593eb114a61 (old id 1300016)
date added to LUP
2009-02-19 09:46:45
date last changed
2017-01-01 05:08:52
@inproceedings{c1fa7d1c-18cb-4acc-8ef5-4593eb114a61,
  abstract     = {This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.},
  author       = {Skjolding, Lars Henrik and Turon Teixidor, Genis and Emnéus, Jenny and Montelius, Lars},
  booktitle    = {Microelectronic Engineering},
  issn         = {1873-5568},
  keyword      = {Interdigitated electrodes,Alignment strategy,Mix-and-match lithography,UV lithography,NIL,SU-8 2005},
  language     = {eng},
  number       = {4-6},
  pages        = {654--656},
  publisher    = {Elsevier},
  title        = {Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures},
  url          = {http://dx.doi.org/10.1016/j.mee.2008.12.077},
  volume       = {86},
  year         = {2009},
}