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Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.

Meng, Fantao; Luo, Gang LU ; Maximov, Ivan LU ; Montelius, Lars LU ; Zhou, Ye; Nilsson, Lars LU ; Carlberg, Patrick LU ; Heidari, Babak; Chu, Jinkui and Xu, Hongqi LU (2011) In Nanotechnology 22(18).
Abstract
Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively... (More)
Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning. (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Nanotechnology
volume
22
issue
18
publisher
IOP Publishing
external identifiers
  • wos:000288653300004
  • pmid:21415472
  • scopus:79953271908
ISSN
0957-4484
DOI
10.1088/0957-4484/22/18/185301
language
English
LU publication?
yes
id
93d20eba-b21b-4380-a2da-96f51c2ef2e7 (old id 1883813)
date added to LUP
2011-04-05 13:44:59
date last changed
2017-01-01 03:38:15
@article{93d20eba-b21b-4380-a2da-96f51c2ef2e7,
  abstract     = {Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.},
  articleno    = {185301},
  author       = {Meng, Fantao and Luo, Gang and Maximov, Ivan and Montelius, Lars and Zhou, Ye and Nilsson, Lars and Carlberg, Patrick and Heidari, Babak and Chu, Jinkui and Xu, Hongqi},
  issn         = {0957-4484},
  language     = {eng},
  number       = {18},
  publisher    = {IOP Publishing},
  series       = {Nanotechnology},
  title        = {Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.},
  url          = {http://dx.doi.org/10.1088/0957-4484/22/18/185301},
  volume       = {22},
  year         = {2011},
}