Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
(2011) In Nanotechnology 22(18).- Abstract
- Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively... (More)
- Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/1883813
- author
- Meng, Fantao ; Luo, Gang LU ; Maximov, Ivan LU ; Montelius, Lars LU ; Zhou, Ye ; Nilsson, Lars LU ; Carlberg, Patrick LU ; Heidari, Babak ; Chu, Jinkui and Xu, Hongqi LU
- organization
- publishing date
- 2011
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Nanotechnology
- volume
- 22
- issue
- 18
- article number
- 185301
- publisher
- IOP Publishing
- external identifiers
-
- wos:000288653300004
- pmid:21415472
- scopus:79953271908
- ISSN
- 0957-4484
- DOI
- 10.1088/0957-4484/22/18/185301
- language
- English
- LU publication?
- yes
- id
- 93d20eba-b21b-4380-a2da-96f51c2ef2e7 (old id 1883813)
- date added to LUP
- 2016-04-01 10:29:15
- date last changed
- 2023-08-31 04:15:09
@article{93d20eba-b21b-4380-a2da-96f51c2ef2e7,
abstract = {{Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.}},
author = {{Meng, Fantao and Luo, Gang and Maximov, Ivan and Montelius, Lars and Zhou, Ye and Nilsson, Lars and Carlberg, Patrick and Heidari, Babak and Chu, Jinkui and Xu, Hongqi}},
issn = {{0957-4484}},
language = {{eng}},
number = {{18}},
publisher = {{IOP Publishing}},
series = {{Nanotechnology}},
title = {{Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.}},
url = {{http://dx.doi.org/10.1088/0957-4484/22/18/185301}},
doi = {{10.1088/0957-4484/22/18/185301}},
volume = {{22}},
year = {{2011}},
}