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Liquid-target laser-plasma source for X-ray lithography

Malmqvist, L; Bogdanov, A. L; Montelius, Lars LU and Hertz, H. M (1997) In Microelectronic Engineering 35(1-4). p.535-536
Abstract
We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Microelectronic Engineering
volume
35
issue
1-4
pages
535 - 536
publisher
Elsevier
external identifiers
  • scopus:0031073867
ISSN
1873-5568
DOI
10.1016/S0167-9317(97)87391-1
language
English
LU publication?
yes
id
2d15258f-f5e8-4855-9ede-58235d6c2603 (old id 2258943)
date added to LUP
2012-02-17 23:19:08
date last changed
2017-01-01 07:37:09
@article{2d15258f-f5e8-4855-9ede-58235d6c2603,
  abstract     = {We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.},
  author       = {Malmqvist, L and Bogdanov, A. L and Montelius, Lars and Hertz, H. M},
  issn         = {1873-5568},
  language     = {eng},
  number       = {1-4},
  pages        = {535--536},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Liquid-target laser-plasma source for X-ray lithography},
  url          = {http://dx.doi.org/10.1016/S0167-9317(97)87391-1},
  volume       = {35},
  year         = {1997},
}