Advanced

The beam blanking system for microlithography at Lund Nuclear microprobe

Auzelyte, Vaida LU ; Elfman, Mikael LU ; Kristiansson, Per LU ; Malmqvist, Klas LU ; Wallman, Lars LU ; Nilsson, Christer LU ; Pallon, Jan LU ; Shariff, Asad LU and Wegdén, Marie LU (2004) In Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms 219-20. p.485-489
Abstract
A new beam blanking system was installed at the Lund Nuclear Microprobe and employed in proton beam lithography (PBL) for polymer microstructures fabrication. The blanker consists of two parallel plates connected to a high voltage generator. Measurement of the beam blanking time on a sample was performed by means of the standard PIXE system. The beam is blanked and returns to a sample within 200 ns. The blanking system is designed for the new sub-micrometer beamline under installation in the accelerator laboratory. A number of pilot MeV ion beam lithography experiments were performed to illustrate the possibility to use the blanking system in combination with the existing data acquisition and scanning system. A 2.5 MeV proton beam was used... (More)
A new beam blanking system was installed at the Lund Nuclear Microprobe and employed in proton beam lithography (PBL) for polymer microstructures fabrication. The blanker consists of two parallel plates connected to a high voltage generator. Measurement of the beam blanking time on a sample was performed by means of the standard PIXE system. The beam is blanked and returns to a sample within 200 ns. The blanking system is designed for the new sub-micrometer beamline under installation in the accelerator laboratory. A number of pilot MeV ion beam lithography experiments were performed to illustrate the possibility to use the blanking system in combination with the existing data acquisition and scanning system. A 2.5 MeV proton beam was used to irradiate 50 mum SU-8 negative resist. The blanker was shown to be a necessary part of the lithography system. It enables blanking between each pixel and hence fabrication of various patterns down to a single pixel. The blanker has significantly simplified beam control and enhanced process time and spatial resolution. Three-dimensional microstructures with 20:1 aspect ratio were fabricated. (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
ion beam lithography, beam blanking, proton beam lithography, beam control, micromachining
in
Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
volume
219-20
pages
485 - 489
publisher
Elsevier
external identifiers
  • wos:000221895800092
  • scopus:2442430210
ISSN
0168-583X
DOI
10.1016/j.nimb.2004.01.107
language
English
LU publication?
yes
id
afed2743-a346-4e40-8a7d-ae285c3ca809 (old id 275131)
date added to LUP
2007-10-16 14:33:58
date last changed
2017-05-14 04:10:00
@article{afed2743-a346-4e40-8a7d-ae285c3ca809,
  abstract     = {A new beam blanking system was installed at the Lund Nuclear Microprobe and employed in proton beam lithography (PBL) for polymer microstructures fabrication. The blanker consists of two parallel plates connected to a high voltage generator. Measurement of the beam blanking time on a sample was performed by means of the standard PIXE system. The beam is blanked and returns to a sample within 200 ns. The blanking system is designed for the new sub-micrometer beamline under installation in the accelerator laboratory. A number of pilot MeV ion beam lithography experiments were performed to illustrate the possibility to use the blanking system in combination with the existing data acquisition and scanning system. A 2.5 MeV proton beam was used to irradiate 50 mum SU-8 negative resist. The blanker was shown to be a necessary part of the lithography system. It enables blanking between each pixel and hence fabrication of various patterns down to a single pixel. The blanker has significantly simplified beam control and enhanced process time and spatial resolution. Three-dimensional microstructures with 20:1 aspect ratio were fabricated.},
  author       = {Auzelyte, Vaida and Elfman, Mikael and Kristiansson, Per and Malmqvist, Klas and Wallman, Lars and Nilsson, Christer and Pallon, Jan and Shariff, Asad and Wegdén, Marie},
  issn         = {0168-583X},
  keyword      = {ion beam lithography,beam blanking,proton beam lithography,beam control,micromachining},
  language     = {eng},
  pages        = {485--489},
  publisher    = {Elsevier},
  series       = {Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms},
  title        = {The beam blanking system for microlithography at Lund Nuclear microprobe},
  url          = {http://dx.doi.org/10.1016/j.nimb.2004.01.107},
  volume       = {219-20},
  year         = {2004},
}