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Liquid-target laser-plasma source for X-ray lithography

Malmqvist, L ; Bogdanov, A. L ; Montelius, Lars LU and Hertz, H. M (1997) In Microelectronic Engineering 35(1-4). p.535-536
Abstract
We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.
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author
; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Microelectronic Engineering
volume
35
issue
1-4
pages
535 - 536
publisher
Elsevier
external identifiers
  • scopus:0031073867
ISSN
1873-5568
DOI
10.1016/S0167-9317(97)87391-1
language
English
LU publication?
yes
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Atomic physics (011013005), Physics, Faculty of Technology (011013200)
id
2d15258f-f5e8-4855-9ede-58235d6c2603 (old id 2258943)
date added to LUP
2016-04-04 08:33:10
date last changed
2022-01-29 03:32:16
@article{2d15258f-f5e8-4855-9ede-58235d6c2603,
  abstract     = {{We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.}},
  author       = {{Malmqvist, L and Bogdanov, A. L and Montelius, Lars and Hertz, H. M}},
  issn         = {{1873-5568}},
  language     = {{eng}},
  number       = {{1-4}},
  pages        = {{535--536}},
  publisher    = {{Elsevier}},
  series       = {{Microelectronic Engineering}},
  title        = {{Liquid-target laser-plasma source for X-ray lithography}},
  url          = {{https://lup.lub.lu.se/search/files/5183435/2297447.pdf}},
  doi          = {{10.1016/S0167-9317(97)87391-1}},
  volume       = {{35}},
  year         = {{1997}},
}