Fabrication of high aspect ratio SU-8 micropillar arrays
(2012) In Microelectronic Engineering 98(Special issue MNE 2011 - Part II). p.483-487- Abstract
- SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the... (More)
- SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8 μm, AR = 11 and an improved temporal stability. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/3128750
- author
- Amato, Letizia ; Keller, Stephan S. ; Heiskanen, Arto LU ; Dimaki, Maria ; Emnéus, Jenny LU ; Boisen, Anja and Tenje, Maria LU
- publishing date
- 2012
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- High-aspect ratio SU-8, Micropillars, UV photolithography
- in
- Microelectronic Engineering
- volume
- 98
- issue
- Special issue MNE 2011 - Part II
- pages
- 483 - 487
- publisher
- Elsevier
- external identifiers
-
- scopus:84865584866
- ISSN
- 1873-5568
- DOI
- 10.1016/j.mee.2012.07.092
- language
- English
- LU publication?
- no
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Analytical Chemistry (S/LTH) (011001004), Biomedical Engineering (011200011)
- id
- 30634cf3-5782-4ccc-9ca5-a781b764d34e (old id 3128750)
- date added to LUP
- 2016-04-01 10:58:45
- date last changed
- 2024-07-02 13:20:56
@article{30634cf3-5782-4ccc-9ca5-a781b764d34e, abstract = {{SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8 μm, AR = 11 and an improved temporal stability.}}, author = {{Amato, Letizia and Keller, Stephan S. and Heiskanen, Arto and Dimaki, Maria and Emnéus, Jenny and Boisen, Anja and Tenje, Maria}}, issn = {{1873-5568}}, keywords = {{High-aspect ratio SU-8; Micropillars; UV photolithography}}, language = {{eng}}, number = {{Special issue MNE 2011 - Part II}}, pages = {{483--487}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Fabrication of high aspect ratio SU-8 micropillar arrays}}, url = {{http://dx.doi.org/10.1016/j.mee.2012.07.092}}, doi = {{10.1016/j.mee.2012.07.092}}, volume = {{98}}, year = {{2012}}, }