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Gold cleaning methods for electrochemical detection applications

Fischer, Lee M.; Tenje, Maria LU ; Heiskanen, Arto R.; Masuda, Noriyuki; Castillo Leon, Jaime LU ; Bentien, Anders; Emnéus, Jenny LU ; Jakobsen, Mogens H. and Boisen, Anja (2009) In Microelectronic Engineering 86(4-6). p.1282-1285
Abstract
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance... (More)
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (Less)
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author
publishing date
type
Contribution to journal
publication status
published
subject
in
Microelectronic Engineering
volume
86
issue
4-6
pages
1282 - 1285
publisher
Elsevier
external identifiers
  • scopus:67349192177
ISSN
1873-5568
DOI
10.1016/j.mee.2008.11.045
language
English
LU publication?
no
id
c6293b6c-3784-4ce1-976b-13c15b3e21f7 (old id 3130332)
date added to LUP
2012-10-17 14:33:04
date last changed
2017-11-19 03:37:13
@article{c6293b6c-3784-4ce1-976b-13c15b3e21f7,
  abstract     = {This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.},
  author       = {Fischer, Lee M. and Tenje, Maria and Heiskanen, Arto R. and Masuda, Noriyuki and Castillo Leon, Jaime and Bentien, Anders and Emnéus, Jenny and Jakobsen, Mogens H. and Boisen, Anja},
  issn         = {1873-5568},
  language     = {eng},
  number       = {4-6},
  pages        = {1282--1285},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Gold cleaning methods for electrochemical detection applications},
  url          = {http://dx.doi.org/10.1016/j.mee.2008.11.045},
  volume       = {86},
  year         = {2009},
}