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Gold cleaning methods for electrochemical detection applications

Fischer, Lee M. ; Tenje, Maria LU ; Heiskanen, Arto R. ; Masuda, Noriyuki ; Castillo Leon, Jaime LU ; Bentien, Anders ; Emnéus, Jenny LU ; Jakobsen, Mogens H. and Boisen, Anja (2009) In Microelectronic Engineering 86(4-6). p.1282-1285
Abstract
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance... (More)
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (Less)
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author
; ; ; ; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
subject
in
Microelectronic Engineering
volume
86
issue
4-6
pages
1282 - 1285
publisher
Elsevier
external identifiers
  • scopus:67349192177
ISSN
1873-5568
DOI
10.1016/j.mee.2008.11.045
language
English
LU publication?
no
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Biomedical Engineering (011200011), Analytical Chemistry (S/LTH) (011001004)
id
c6293b6c-3784-4ce1-976b-13c15b3e21f7 (old id 3130332)
date added to LUP
2016-04-01 12:24:28
date last changed
2024-07-02 13:20:59
@article{c6293b6c-3784-4ce1-976b-13c15b3e21f7,
  abstract     = {{This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.}},
  author       = {{Fischer, Lee M. and Tenje, Maria and Heiskanen, Arto R. and Masuda, Noriyuki and Castillo Leon, Jaime and Bentien, Anders and Emnéus, Jenny and Jakobsen, Mogens H. and Boisen, Anja}},
  issn         = {{1873-5568}},
  language     = {{eng}},
  number       = {{4-6}},
  pages        = {{1282--1285}},
  publisher    = {{Elsevier}},
  series       = {{Microelectronic Engineering}},
  title        = {{Gold cleaning methods for electrochemical detection applications}},
  url          = {{http://dx.doi.org/10.1016/j.mee.2008.11.045}},
  doi          = {{10.1016/j.mee.2008.11.045}},
  volume       = {{86}},
  year         = {{2009}},
}