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Quantitative characterization of aberrations in x-ray optics

Seiboth, Frank ; Kahnt, Maik LU ; Scholz, Maria ; Seyrich, Martin ; Wittwer, Felix ; Garrevoet, Jan ; Falkenberg, Gerald ; Schropp, Andreas and Schroer, Christian G. (2016) 9963.
Abstract

Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and... (More)

Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

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Please use this url to cite or link to this publication:
author
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
keywords
aberrations, Beam characterization, compound refractive X-ray lenses, hard X-ray nanobeam, ptychography, Zernike polynomials
host publication
Advances in X-Ray/EUV Optics and Components XI
editor
Morawe, Christian ; Khounsary, Ali M. ; Goto, Shunji ; ; and
volume
9963
article number
99630P
publisher
SPIE
external identifiers
  • scopus:85010756904
ISBN
9781510603172
DOI
10.1117/12.2237646
language
English
LU publication?
no
id
34b1843f-bfe9-4e49-946f-d6a6dc8e104f
date added to LUP
2019-10-12 12:54:28
date last changed
2019-12-03 02:19:55
@inproceedings{34b1843f-bfe9-4e49-946f-d6a6dc8e104f,
  abstract     = {<p>Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.</p>},
  author       = {Seiboth, Frank and Kahnt, Maik and Scholz, Maria and Seyrich, Martin and Wittwer, Felix and Garrevoet, Jan and Falkenberg, Gerald and Schropp, Andreas and Schroer, Christian G.},
  booktitle    = {Advances in X-Ray/EUV Optics and Components XI},
  editor       = {Morawe, Christian and Khounsary, Ali M. and Goto, Shunji},
  isbn         = {9781510603172},
  language     = {eng},
  month        = {01},
  publisher    = {SPIE},
  title        = {Quantitative characterization of aberrations in x-ray optics},
  url          = {http://dx.doi.org/10.1117/12.2237646},
  doi          = {10.1117/12.2237646},
  volume       = {9963},
  year         = {2016},
}