Improved subthreshold slope in an InAs nanowire heterostructure field-effect transistor
(2006) In Nano Letters 6(9). p.1842-1846- Abstract
- An n-type InAs/InAsP heterostructure nanowire field-effect transistor has been fabricated and compared with a homogeneous InAs field-effect transistor. For the same device geometry, by introduction of the heterostructure, the threshold voltage is shifted 4 V, the maximum current on-off ratio is enhanced by a factor of 10 000, and the subthreshold swing is lowered by a factor 4 compared to the homogeneous transistor. At the same time, the drive current remains constant for a fixed gate overdrive. A single nanowire heterostructure transistor has a transconductance of 5 mu A/V at a low source-drain voltage of 0.3 V. For the homogeneous InAs transistor, we deduced a high electron mobility of 1500 cm(2)/Vs.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/393998
- author
- Lind, Erik LU ; Persson, Ann LU ; Samuelson, Lars LU and Wernersson, Lars-Erik LU
- organization
- publishing date
- 2006
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Nano Letters
- volume
- 6
- issue
- 9
- pages
- 1842 - 1846
- publisher
- The American Chemical Society (ACS)
- external identifiers
-
- pmid:16967988
- wos:000240465100002
- scopus:33749684169
- pmid:16967988
- ISSN
- 1530-6992
- DOI
- 10.1021/nl052468b
- language
- English
- LU publication?
- yes
- id
- 35883913-cb7d-45f2-bd0c-a9fbc8aba56d (old id 393998)
- date added to LUP
- 2016-04-01 17:15:15
- date last changed
- 2024-02-27 14:36:14
@article{35883913-cb7d-45f2-bd0c-a9fbc8aba56d, abstract = {{An n-type InAs/InAsP heterostructure nanowire field-effect transistor has been fabricated and compared with a homogeneous InAs field-effect transistor. For the same device geometry, by introduction of the heterostructure, the threshold voltage is shifted 4 V, the maximum current on-off ratio is enhanced by a factor of 10 000, and the subthreshold swing is lowered by a factor 4 compared to the homogeneous transistor. At the same time, the drive current remains constant for a fixed gate overdrive. A single nanowire heterostructure transistor has a transconductance of 5 mu A/V at a low source-drain voltage of 0.3 V. For the homogeneous InAs transistor, we deduced a high electron mobility of 1500 cm(2)/Vs.}}, author = {{Lind, Erik and Persson, Ann and Samuelson, Lars and Wernersson, Lars-Erik}}, issn = {{1530-6992}}, language = {{eng}}, number = {{9}}, pages = {{1842--1846}}, publisher = {{The American Chemical Society (ACS)}}, series = {{Nano Letters}}, title = {{Improved subthreshold slope in an InAs nanowire heterostructure field-effect transistor}}, url = {{http://dx.doi.org/10.1021/nl052468b}}, doi = {{10.1021/nl052468b}}, volume = {{6}}, year = {{2006}}, }