Characterization of semiconductors by synchrotron-based techniques
(2024) 2. p.2-577- Abstract
Techniques based on intense photon beams from synchrotrons present unique opportunities for characterizing semiconductor materials, devices and processes. This is based on the unrivaled brightness in a broad wavelength range from infrared to hard X-rays. Synchrotron based methods can answer wide ranging questions in research and technology, and have seen an increase in use over many years as more and more powerful facilities have emerged. We will briefly introduce synchrotron radiation sources, give an overview of techniques relevant for semiconductor characterization and a range of examples to illustrate their use.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/3c7e77ce-1e6c-4951-90d1-30e0d50abd74
- author
- Benter, Sandra LU and Mikkelsen, Anders LU
- organization
- publishing date
- 2024-01-01
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- Band structure, Bulk information, Chemical composition, Crystal structure, Devices, Diffraction, Doping, Heterostructure, In-operando, In-situ, Luminescence, Microscopy, Nanostructure, Photoemission, Scattering, Spectroscopy, Strain, Surface, Synchrotron, X-ray
- host publication
- Comprehensive Semiconductor Science and Technology, Second Edition : Volumes 1-3 - Volumes 1-3
- volume
- 2
- pages
- 2 - 577
- publisher
- Elsevier
- external identifiers
-
- scopus:85217074935
- ISBN
- 9780323958196
- 9780323960274
- DOI
- 10.1016/B978-0-323-96027-4.00036-X
- language
- English
- LU publication?
- yes
- additional info
- Publisher Copyright: © 2025 Elsevier B.V. All rights are reserved, including those for text and data mining, AI training, and similar technologies.
- id
- 3c7e77ce-1e6c-4951-90d1-30e0d50abd74
- date added to LUP
- 2025-05-06 09:53:07
- date last changed
- 2025-05-06 09:53:51
@inbook{3c7e77ce-1e6c-4951-90d1-30e0d50abd74, abstract = {{<p>Techniques based on intense photon beams from synchrotrons present unique opportunities for characterizing semiconductor materials, devices and processes. This is based on the unrivaled brightness in a broad wavelength range from infrared to hard X-rays. Synchrotron based methods can answer wide ranging questions in research and technology, and have seen an increase in use over many years as more and more powerful facilities have emerged. We will briefly introduce synchrotron radiation sources, give an overview of techniques relevant for semiconductor characterization and a range of examples to illustrate their use.</p>}}, author = {{Benter, Sandra and Mikkelsen, Anders}}, booktitle = {{Comprehensive Semiconductor Science and Technology, Second Edition : Volumes 1-3}}, isbn = {{9780323958196}}, keywords = {{Band structure; Bulk information; Chemical composition; Crystal structure; Devices; Diffraction; Doping; Heterostructure; In-operando; In-situ; Luminescence; Microscopy; Nanostructure; Photoemission; Scattering; Spectroscopy; Strain; Surface; Synchrotron; X-ray}}, language = {{eng}}, month = {{01}}, pages = {{2--577}}, publisher = {{Elsevier}}, title = {{Characterization of semiconductors by synchrotron-based techniques}}, url = {{http://dx.doi.org/10.1016/B978-0-323-96027-4.00036-X}}, doi = {{10.1016/B978-0-323-96027-4.00036-X}}, volume = {{2}}, year = {{2024}}, }