Site-control of InAs quantum dots on a patterned InP surface: As/P exchange reactions
(2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)- Abstract
- We present the effect of annealing temperature and annealing time on InAs/InP site-controlled quantum dot growth. Electron beam pre-patterning forms carbon nano-deposits at the InP surface, which then can be used as growth masks to form nano-holes at the surface. By only annealing of the patterned InP surface under an arsine ambient, As/P exchange reactions produce material sufficient for selective dot nucleation in the holes at the surface
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/610468
- author
- Borgström, Magnus LU ; Bryllert, Tomas LU ; Sass, T. ; Wernersson, Lars-Erik LU ; Samuelson, Lars LU and Seifert, Werner LU
- organization
- publishing date
- 2002
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- selective dot nucleation, arsine ambient, InAs-InP, nanoholes, patterned InP surface, InAs quantum dots, As/P exchange reactions, annealing temperature, annealing time, InAs/InP site controlled quantum dot growth, electron beam prepatterning forms, carbon nanodeposits, growth masks, InP surface
- host publication
- 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science
- pages
- 2 pages
- publisher
- Lund University
- conference name
- Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- conference location
- Malmö, Sweden
- conference dates
- 2002-06-24 - 2002-06-28
- language
- English
- LU publication?
- yes
- id
- 65732360-54bc-4d8f-917b-b62b3313a6c8 (old id 610468)
- date added to LUP
- 2016-04-04 10:32:15
- date last changed
- 2018-11-21 20:59:20
@inproceedings{65732360-54bc-4d8f-917b-b62b3313a6c8, abstract = {{We present the effect of annealing temperature and annealing time on InAs/InP site-controlled quantum dot growth. Electron beam pre-patterning forms carbon nano-deposits at the InP surface, which then can be used as growth masks to form nano-holes at the surface. By only annealing of the patterned InP surface under an arsine ambient, As/P exchange reactions produce material sufficient for selective dot nucleation in the holes at the surface}}, author = {{Borgström, Magnus and Bryllert, Tomas and Sass, T. and Wernersson, Lars-Erik and Samuelson, Lars and Seifert, Werner}}, booktitle = {{7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science}}, keywords = {{selective dot nucleation; arsine ambient; InAs-InP; nanoholes; patterned InP surface; InAs quantum dots; As/P exchange reactions; annealing temperature; annealing time; InAs/InP site controlled quantum dot growth; electron beam prepatterning forms; carbon nanodeposits; growth masks; InP surface}}, language = {{eng}}, publisher = {{Lund University}}, title = {{Site-control of InAs quantum dots on a patterned InP surface: As/P exchange reactions}}, year = {{2002}}, }