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Area-selective Electron-beam induced deposition of Amorphous-BNx on graphene

Boix, Virgínia LU ; Struzzi, Claudia LU orcid ; Gallo, Tamires LU ; Johansson, Niclas LU ; D'acunto, Giulio LU ; Yong, Zhihua LU ; Zakharov, Alexei LU ; Li, Zheshen ; Schnadt, Joachim LU orcid and Mikkelsen, Anders LU , et al. (2021) In Applied Surface Science 557. p.149806-149806
Abstract

Thin, stable and inert dielectric spacers are essential for manufacturing electronic devices based on 2D materials. However, direct synthesis on top of 2D materials is difficult due to their inert nature. In this work, we studied how an electron beam induces fragmentation of borazine and enables spatially confined synthesis of amorphous-BNx on graphene at room temperature. Using a combination of X-ray Photoelectron Spectroscopy, Low Energy Electron Microscopy, and Scanning Tunneling Microscopy we studied the morphology of the heterostructure, its chemical composition, and finally its temperature evolution. We find that electron-beam induced deposition starts by the binding of heavily fragmentized borazine, including atomic... (More)

Thin, stable and inert dielectric spacers are essential for manufacturing electronic devices based on 2D materials. However, direct synthesis on top of 2D materials is difficult due to their inert nature. In this work, we studied how an electron beam induces fragmentation of borazine and enables spatially confined synthesis of amorphous-BNx on graphene at room temperature. Using a combination of X-ray Photoelectron Spectroscopy, Low Energy Electron Microscopy, and Scanning Tunneling Microscopy we studied the morphology of the heterostructure, its chemical composition, and finally its temperature evolution. We find that electron-beam induced deposition starts by the binding of heavily fragmentized borazine, including atomic boron, followed by the growth of a multilayer with a 1:0.7 B:N ratio. The final structure exhibits a thermal stability up to 1400 K and ~ 50 nm spatial control provided by the electron beam. Our studies provide surface science insight into the use of electron beams for synthesis and lateral control of stable and inert layers in 2D heterostructures.

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organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Amorphous Boron Nitride, Electron-Beam Induced Deposition, Graphene, LEEM, STM, XPS
in
Applied Surface Science
volume
557
pages
149806 - 149806
publisher
Elsevier
external identifiers
  • scopus:85105693615
ISSN
0169-4332
DOI
10.1016/j.apsusc.2021.149806
language
English
LU publication?
yes
id
6ffe2faf-de67-4052-9c7b-e24372b04756
date added to LUP
2021-05-26 16:16:41
date last changed
2023-10-10 20:13:50
@article{6ffe2faf-de67-4052-9c7b-e24372b04756,
  abstract     = {{<p>Thin, stable and inert dielectric spacers are essential for manufacturing electronic devices based on 2D materials. However, direct synthesis on top of 2D materials is difficult due to their inert nature. In this work, we studied how an electron beam induces fragmentation of borazine and enables spatially confined synthesis of amorphous-BN<sub>x</sub> on graphene at room temperature. Using a combination of X-ray Photoelectron Spectroscopy, Low Energy Electron Microscopy, and Scanning Tunneling Microscopy we studied the morphology of the heterostructure, its chemical composition, and finally its temperature evolution. We find that electron-beam induced deposition starts by the binding of heavily fragmentized borazine, including atomic boron, followed by the growth of a multilayer with a 1:0.7 B:N ratio. The final structure exhibits a thermal stability up to 1400 K and ~ 50 nm spatial control provided by the electron beam. Our studies provide surface science insight into the use of electron beams for synthesis and lateral control of stable and inert layers in 2D heterostructures.</p>}},
  author       = {{Boix, Virgínia and Struzzi, Claudia and Gallo, Tamires and Johansson, Niclas and D'acunto, Giulio and Yong, Zhihua and Zakharov, Alexei and Li, Zheshen and Schnadt, Joachim and Mikkelsen, Anders and Knudsen, Jan}},
  issn         = {{0169-4332}},
  keywords     = {{Amorphous Boron Nitride; Electron-Beam Induced Deposition; Graphene; LEEM; STM; XPS}},
  language     = {{eng}},
  month        = {{08}},
  pages        = {{149806--149806}},
  publisher    = {{Elsevier}},
  series       = {{Applied Surface Science}},
  title        = {{Area-selective Electron-beam induced deposition of Amorphous-BN<sub>x</sub> on graphene}},
  url          = {{http://dx.doi.org/10.1016/j.apsusc.2021.149806}},
  doi          = {{10.1016/j.apsusc.2021.149806}},
  volume       = {{557}},
  year         = {{2021}},
}