Electrical and Surface Properties of InAs/InSb Nanowires Cleaned by Atomic Hydrogen
(2015) In Nano Letters 15(8). p.4865-4875- Abstract
- We present a study of InAs/InSb heterostructured nanowires by X-ray photoemission spectroscopy (XPS), scanning tunneling microscopy (STM), and in-vacuum electrical measurements. Starting with pristine nanowires covered only by the native oxide formed through exposure to ambient air, we investigate the effect of atomic hydrogen cleaning on the surface chemistry and electrical performance. We find that clean and unreconstructed nanowire surfaces can be obtained simultaneously for both InSb and InAs by heating to 380 +/- 20 degrees C under an H-2 pressure 2 X 10(-6) mbar. Through electrical measurement of individual nanowires, we observe an increase in conductivity of 2 orders of magnitude by atomic hydrogen cleaning, which we relate through... (More)
- We present a study of InAs/InSb heterostructured nanowires by X-ray photoemission spectroscopy (XPS), scanning tunneling microscopy (STM), and in-vacuum electrical measurements. Starting with pristine nanowires covered only by the native oxide formed through exposure to ambient air, we investigate the effect of atomic hydrogen cleaning on the surface chemistry and electrical performance. We find that clean and unreconstructed nanowire surfaces can be obtained simultaneously for both InSb and InAs by heating to 380 +/- 20 degrees C under an H-2 pressure 2 X 10(-6) mbar. Through electrical measurement of individual nanowires, we observe an increase in conductivity of 2 orders of magnitude by atomic hydrogen cleaning, which we relate through theoretical simulation to the contact-nanowire junction and nanowire surface Fermi level pinning. Our study demonstrates the significant potential of atomic hydrogen cleaning regarding device fabrication when high quality contacts or complete control of the surface structure is required. As hydrogen cleaning has recently been shown to work for many different types of III-V nano-wires, our findings should be applicable far beyond the present materials system. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/7972320
- author
- Webb, James LU ; Knutsson, Johan LU ; Hjort, Martin LU ; Gorji, Sepideh LU ; Dick Thelander, Kimberly LU ; Timm, Rainer LU and Mikkelsen, Anders LU
- organization
- publishing date
- 2015
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- heterostructure, III-V, InAs, InSb, STM, nanowire
- in
- Nano Letters
- volume
- 15
- issue
- 8
- pages
- 4865 - 4875
- publisher
- The American Chemical Society (ACS)
- external identifiers
-
- wos:000359613700005
- scopus:84939241086
- pmid:25989255
- ISSN
- 1530-6992
- DOI
- 10.1021/acs.nanolett.5b00282
- language
- English
- LU publication?
- yes
- id
- f61b7865-359c-47e3-aefa-104332f3e689 (old id 7972320)
- date added to LUP
- 2016-04-01 14:37:20
- date last changed
- 2023-11-13 09:57:03
@article{f61b7865-359c-47e3-aefa-104332f3e689, abstract = {{We present a study of InAs/InSb heterostructured nanowires by X-ray photoemission spectroscopy (XPS), scanning tunneling microscopy (STM), and in-vacuum electrical measurements. Starting with pristine nanowires covered only by the native oxide formed through exposure to ambient air, we investigate the effect of atomic hydrogen cleaning on the surface chemistry and electrical performance. We find that clean and unreconstructed nanowire surfaces can be obtained simultaneously for both InSb and InAs by heating to 380 +/- 20 degrees C under an H-2 pressure 2 X 10(-6) mbar. Through electrical measurement of individual nanowires, we observe an increase in conductivity of 2 orders of magnitude by atomic hydrogen cleaning, which we relate through theoretical simulation to the contact-nanowire junction and nanowire surface Fermi level pinning. Our study demonstrates the significant potential of atomic hydrogen cleaning regarding device fabrication when high quality contacts or complete control of the surface structure is required. As hydrogen cleaning has recently been shown to work for many different types of III-V nano-wires, our findings should be applicable far beyond the present materials system.}}, author = {{Webb, James and Knutsson, Johan and Hjort, Martin and Gorji, Sepideh and Dick Thelander, Kimberly and Timm, Rainer and Mikkelsen, Anders}}, issn = {{1530-6992}}, keywords = {{heterostructure; III-V; InAs; InSb; STM; nanowire}}, language = {{eng}}, number = {{8}}, pages = {{4865--4875}}, publisher = {{The American Chemical Society (ACS)}}, series = {{Nano Letters}}, title = {{Electrical and Surface Properties of InAs/InSb Nanowires Cleaned by Atomic Hydrogen}}, url = {{http://dx.doi.org/10.1021/acs.nanolett.5b00282}}, doi = {{10.1021/acs.nanolett.5b00282}}, volume = {{15}}, year = {{2015}}, }