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Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques

Graczyk, Mariusz LU ; Cattoni, Andrea; Rösner, Benedikt; Seniutinas, Gediminas; Löfstrand, Anette LU ; Kvennefors, Anders LU ; Mailly, Dominique; David, Christian and Maximov, Ivan LU (2018) In Microelectronic Engineering 190. p.73-78
Abstract

Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.

Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Nanoimprint, OrmoStamp, Pattern transfer, Stamp, Ultra-high resolution
in
Microelectronic Engineering
volume
190
pages
6 pages
publisher
Elsevier
external identifiers
  • scopus:85041452825
ISSN
0167-9317
DOI
10.1016/j.mee.2018.01.008
language
English
LU publication?
yes
id
92263abf-5a80-448f-82cf-e9b0f63867e1
date added to LUP
2018-02-20 09:57:15
date last changed
2018-05-29 10:53:32
@article{92263abf-5a80-448f-82cf-e9b0f63867e1,
  abstract     = {<p>Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.</p>},
  author       = {Graczyk, Mariusz and Cattoni, Andrea and Rösner, Benedikt and Seniutinas, Gediminas and Löfstrand, Anette and Kvennefors, Anders and Mailly, Dominique and David, Christian and Maximov, Ivan},
  issn         = {0167-9317},
  keyword      = {Nanoimprint,OrmoStamp,Pattern transfer,Stamp,Ultra-high resolution},
  language     = {eng},
  month        = {04},
  pages        = {73--78},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques},
  url          = {http://dx.doi.org/10.1016/j.mee.2018.01.008},
  volume       = {190},
  year         = {2018},
}