Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
Graczyk, Mariusz LU ; Cattoni, Andrea ; Rösner, Benedikt ; Seniutinas, Gediminas ; Löfstrand, Anette LU ; Kvennefors, Anders LU ; Mailly, Dominique ; David, Christian and Maximov, Ivan LU
(2018)
In Microelectronic Engineering
190.
p.73-78
- Abstract
Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/92263abf-5a80-448f-82cf-e9b0f63867e1
- author
- Graczyk, Mariusz
LU
; Cattoni, Andrea
; Rösner, Benedikt
; Seniutinas, Gediminas
; Löfstrand, Anette
LU
; Kvennefors, Anders
LU
; Mailly, Dominique
; David, Christian
and Maximov, Ivan
LU
- organization
- publishing date
- 2018-04-15
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Nanoimprint, OrmoStamp, Pattern transfer, Stamp, Ultra-high resolution
- in
- Microelectronic Engineering
- volume
- 190
- pages
- 6 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:85041452825
- ISSN
- 0167-9317
- DOI
- 10.1016/j.mee.2018.01.008
- language
- English
- LU publication?
- yes
- id
- 92263abf-5a80-448f-82cf-e9b0f63867e1
- date added to LUP
- 2018-02-20 09:57:15
- date last changed
- 2024-10-14 21:51:19
@article{92263abf-5a80-448f-82cf-e9b0f63867e1,
abstract = {{<p>Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.</p>}},
author = {{Graczyk, Mariusz and Cattoni, Andrea and Rösner, Benedikt and Seniutinas, Gediminas and Löfstrand, Anette and Kvennefors, Anders and Mailly, Dominique and David, Christian and Maximov, Ivan}},
issn = {{0167-9317}},
keywords = {{Nanoimprint; OrmoStamp; Pattern transfer; Stamp; Ultra-high resolution}},
language = {{eng}},
month = {{04}},
pages = {{73--78}},
publisher = {{Elsevier}},
series = {{Microelectronic Engineering}},
title = {{Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques}},
url = {{http://dx.doi.org/10.1016/j.mee.2018.01.008}},
doi = {{10.1016/j.mee.2018.01.008}},
volume = {{190}},
year = {{2018}},
}