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Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques

Graczyk, Mariusz LU ; Cattoni, Andrea ; Rösner, Benedikt ; Seniutinas, Gediminas ; Löfstrand, Anette LU ; Kvennefors, Anders LU ; Mailly, Dominique ; David, Christian and Maximov, Ivan LU (2018) In Microelectronic Engineering 190. p.73-78
Abstract

Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.

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author
; ; ; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Nanoimprint, OrmoStamp, Pattern transfer, Stamp, Ultra-high resolution
in
Microelectronic Engineering
volume
190
pages
6 pages
publisher
Elsevier
external identifiers
  • scopus:85041452825
ISSN
0167-9317
DOI
10.1016/j.mee.2018.01.008
language
English
LU publication?
yes
id
92263abf-5a80-448f-82cf-e9b0f63867e1
date added to LUP
2018-02-20 09:57:15
date last changed
2023-10-19 23:59:01
@article{92263abf-5a80-448f-82cf-e9b0f63867e1,
  abstract     = {{<p>Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.</p>}},
  author       = {{Graczyk, Mariusz and Cattoni, Andrea and Rösner, Benedikt and Seniutinas, Gediminas and Löfstrand, Anette and Kvennefors, Anders and Mailly, Dominique and David, Christian and Maximov, Ivan}},
  issn         = {{0167-9317}},
  keywords     = {{Nanoimprint; OrmoStamp; Pattern transfer; Stamp; Ultra-high resolution}},
  language     = {{eng}},
  month        = {{04}},
  pages        = {{73--78}},
  publisher    = {{Elsevier}},
  series       = {{Microelectronic Engineering}},
  title        = {{Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques}},
  url          = {{http://dx.doi.org/10.1016/j.mee.2018.01.008}},
  doi          = {{10.1016/j.mee.2018.01.008}},
  volume       = {{190}},
  year         = {{2018}},
}