An alignment procedure for nanoimprint lithography at the sub-20 nm level
(2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/962753
- author
- organization
- publishing date
- 2005
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
- conference name
- 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
- conference dates
- 0001-01-02
- language
- English
- LU publication?
- yes
- id
- b410b525-f2cd-494d-a3f3-8bfcaeba98b1 (old id 962753)
- date added to LUP
- 2016-04-04 14:15:28
- date last changed
- 2018-11-21 21:19:14
@inproceedings{b410b525-f2cd-494d-a3f3-8bfcaeba98b1, author = {{Adolph, David and Bolmsjö, E and Theander, Elke and Saers, R and Graczyk, Mariusz and Hessman, Dan and Maximov, Ivan and Andersson-Engels, Stefan and Persson, Anders and Wahlström, Claes-Göran and Beck, Marc and Carlberg, Patrick and Heidari, B and Montelius, Lars}}, booktitle = {{Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)}}, language = {{eng}}, title = {{An alignment procedure for nanoimprint lithography at the sub-20 nm level}}, year = {{2005}}, }