InAs/GaSb vertical nanowire TFETs on Si for digital and analogue applications
(2016) 21st IEEE Silicon Nanoelectronics Workshop, SNW 2016 p.154-155- Abstract
Vertical InAs/GaSb nanowire TFETs with diameters of 20 nm and 25 nm have been fabricated and characterized. The influence of diameter, gate-placement, and nanowire numbers have been studied. The best device shows a subthreshold swing of 68 mV/dec at VDS = 0.3 V and 26 μA/μm at VDS = 0.3 V and VGS = 0.5 V. It achieves a self-gain larger than 100 with high transconductance efficiency.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/97aac6af-f489-4012-8a87-75bca63180db
- author
- Memisevic, Elvedin
LU
; Svensson, J.
LU
; Lind, E.
LU
and Wernersson, L. E. LU
- organization
- publishing date
- 2016-09-27
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- 2016 IEEE Silicon Nanoelectronics Workshop, SNW 2016
- article number
- 7578029
- pages
- 2 pages
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- conference name
- 21st IEEE Silicon Nanoelectronics Workshop, SNW 2016
- conference location
- Honolulu, United States
- conference dates
- 2016-06-12 - 2016-06-13
- external identifiers
-
- scopus:84994791027
- ISBN
- 9781509007264
- DOI
- 10.1109/SNW.2016.7578029
- language
- English
- LU publication?
- yes
- id
- 97aac6af-f489-4012-8a87-75bca63180db
- date added to LUP
- 2016-11-25 14:33:34
- date last changed
- 2024-04-19 13:31:40
@inproceedings{97aac6af-f489-4012-8a87-75bca63180db, abstract = {{<p>Vertical InAs/GaSb nanowire TFETs with diameters of 20 nm and 25 nm have been fabricated and characterized. The influence of diameter, gate-placement, and nanowire numbers have been studied. The best device shows a subthreshold swing of 68 mV/dec at V<sub>DS</sub> = 0.3 V and 26 μA/μm at V<sub>DS</sub> = 0.3 V and V<sub>GS</sub> = 0.5 V. It achieves a self-gain larger than 100 with high transconductance efficiency.</p>}}, author = {{Memisevic, Elvedin and Svensson, J. and Lind, E. and Wernersson, L. E.}}, booktitle = {{2016 IEEE Silicon Nanoelectronics Workshop, SNW 2016}}, isbn = {{9781509007264}}, language = {{eng}}, month = {{09}}, pages = {{154--155}}, publisher = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}}, title = {{InAs/GaSb vertical nanowire TFETs on Si for digital and analogue applications}}, url = {{https://lup.lub.lu.se/search/files/47395581/InAs_GaSb_Vertical_Nanowire_TFETs_on_Si_for_Digital_and_Analogue_Applications_Elvedin_Memisevic.pdf}}, doi = {{10.1109/SNW.2016.7578029}}, year = {{2016}}, }