Gold cleaning methods for electrochemical detection applications
(2009) In Microelectronic Engineering 86(4-6). p.1282-1285- Abstract
- This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance... (More)
- This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/3130332
- author
- Fischer, Lee M. ; Tenje, Maria LU ; Heiskanen, Arto R. ; Masuda, Noriyuki ; Castillo Leon, Jaime LU ; Bentien, Anders ; Emnéus, Jenny LU ; Jakobsen, Mogens H. and Boisen, Anja
- publishing date
- 2009
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Microelectronic Engineering
- volume
- 86
- issue
- 4-6
- pages
- 1282 - 1285
- publisher
- Elsevier
- external identifiers
-
- scopus:67349192177
- ISSN
- 1873-5568
- DOI
- 10.1016/j.mee.2008.11.045
- language
- English
- LU publication?
- no
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Biomedical Engineering (011200011), Analytical Chemistry (S/LTH) (011001004)
- id
- c6293b6c-3784-4ce1-976b-13c15b3e21f7 (old id 3130332)
- date added to LUP
- 2016-04-01 12:24:28
- date last changed
- 2024-07-02 13:20:59
@article{c6293b6c-3784-4ce1-976b-13c15b3e21f7, abstract = {{This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.}}, author = {{Fischer, Lee M. and Tenje, Maria and Heiskanen, Arto R. and Masuda, Noriyuki and Castillo Leon, Jaime and Bentien, Anders and Emnéus, Jenny and Jakobsen, Mogens H. and Boisen, Anja}}, issn = {{1873-5568}}, language = {{eng}}, number = {{4-6}}, pages = {{1282--1285}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Gold cleaning methods for electrochemical detection applications}}, url = {{http://dx.doi.org/10.1016/j.mee.2008.11.045}}, doi = {{10.1016/j.mee.2008.11.045}}, volume = {{86}}, year = {{2009}}, }